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Plasma etching device

An etching device and plasma technology, applied in the direction of circuits, discharge tubes, electrical components, etc., can solve problems affecting the quality of TFT substrate products, uneven exhaust airflow, poor etching uniformity of TFT substrates, etc., to achieve enhanced uniformity of etching performance, improved etching uniformity, and good product quality

Inactive Publication Date: 2015-07-01
KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD
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Problems solved by technology

[0007] For this reason, the technical problem to be solved by the present invention is that the exhaust method of the etching device in the prior art will cause obvious inhomogeneity of the exhaust gas flow in the chamber, affect the distribution of plasma, and cause the etching uniformity of the processed TFT substrate to be relatively low. Poor, which affects the quality of TFT substrate products, and provides a flexible adjustment of the exhaust method according to the specific conditions of the etching load, the etching uniformity of the processed TFT substrate is greatly improved, and the plasma etching of the processed TFT substrate product quality is good device

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Embodiment Construction

[0041] Such as image 3 and Figure 4As shown, it is a preferred embodiment of the plasma etching device of the present invention, and the plasma etching device includes a reaction chamber 1, an upper electrode 4, a lower electrode 5, a gas input system, a vacuum obtaining system, an etching end point detector (EPD , EPD: END POINT DETECTOR), the main console and the adjustment mechanism.

[0042] The gas input system is arranged outside the reaction chamber 1 and inputs processing gas into the reaction chamber 1 through the gas input hole 2 . The vacuum obtaining system is arranged outside the reaction chamber 1 , and the reaction product is drawn out of the reaction chamber 1 through the exhaust port 7 . The etching endpoint detector is disposed in the reaction chamber 1 . The main console is used to control the operation of the plasma etching device. The upper electrode 4 and the lower electrode 5 are arranged in the reaction chamber 1, and an exhaust plate 6 (or called...

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Abstract

A plasma etching device comprises a reaction chamber (1), an upper electrode (4), a lower electrode (5), a gas input system, a vacuum obtaining system, an etching termination detector, a main console and an adjusting mechanism. The periphery of the lower electrode (5) is provided with exhausting plates (6), the exhausting plates (6) includes multiple exhausting holes (8) which are distributed separately, and the adjusting mechanism adjusts the ventilation area of the exhausting holes (8) according to the etching load. The plasma etching device can flexibly adjust the exhausting manner according to the practical etching load, the etching uniformity of a TFT substrate to be processed is greatly improved, and a processed TFT substrate is high in quality.

Description

technical field [0001] The invention relates to a plasma etching device in the flat panel display industry, in particular to a plasma etching device which can effectively improve etching uniformity. Background technique [0002] At present, plasma technology such as plasma etching technology is widely used in the processing of TFT (Thin Film Transistor) panels in the flat panel display industry. The so-called plasma technology refers to that the process gas is ionized under the excitation of radio frequency power to form a plasma containing a large number of active particles such as electrons, ions, excited atoms, molecules and free radicals. These active particles and the processed objects (such as TFT Various physical and chemical reactions occur on the surface of the substrate and form volatile products, which changes the properties of the surface of the processed object. [0003] Plasma technology is realized by means of plasma processing equipment. Usually, the proces...

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Application Information

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IPC IPC(8): H01J37/32
CPCH01J37/32H01J37/32449H01J2237/334
Inventor 汪建平李俊峰
Owner KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD