Surface imprinted material capable of selectively adsorbing nordihydroguaiaretic acid and preparation method thereof
A technology of dihydroguaiaretic acid and imprinted materials, applied in chemical instruments and methods, and other chemical processes, can solve the problems of poor practicability, poor selectivity, and low yield, and achieve high reuse rate and easy cleaning , the effect of high affinity
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Embodiment 1
[0033] Example 1: A surface imprinting material with selective adsorption to nordihydroguaiaretic acid, easy cleaning, and good application performance. The mass percentage of each component required to prepare the imprinting material is: nordihydroguaiaretic acid 0.222 %; γ-Aminopropyltriethoxysilane 0.819%; Methyltriethoxysilane 0.264%; Tetraethyl orthosilicate 12.335%; Silicon dioxide 1.480%; 0.01mol L -1 Acetic acid solution 14.803%; porogen ethanol 70.076%.
[0034] Its preparation method is as follows:
[0035]A. Add 0.222% nordihydroguaiaretic acid, 0.819% γ-aminopropyltriethoxysilane, 0.264% methyltriethoxysilane and 70.076% porogen ethanol to the reaction kettle by mass percentage , stirred at room temperature for 1 hour to make it fully pre-reacted;
[0036] B. After the pre-reaction, add 1.480% silicon dioxide and 12.335% tetraethyl orthosilicate respectively by mass percentage, stir at room temperature for 1 hour, and then add 14.803% with a concentration of 0....
Embodiment 2
[0041] Example 2: A surface imprinting material with selective adsorption to nordihydroguaiaretic acid, easy cleaning, and good application performance. The mass percentage of each component required for the preparation of the imprinting material is: nordihydroguaiaretic acid 0.212 %; γ-Aminopropyltriethoxysilane 0.939%; Methyltriethoxysilane 0.252%; Tetraethyl orthosilicate 14.732%; Silicon dioxide 2.827%; 0.01mol L -1 Acetic acid solution 14.134%; porogen ethanol 66.913%.
[0042] Its preparation method is as follows:
[0043] A. Add 0.212% nordihydroguaiaretic acid, 0.939% γ-aminopropyltriethoxysilane, 0.252% methyltriethoxysilane and 66.913% porogen ethanol to the reaction kettle by mass percentage , stirred at room temperature for 1 hour to make it fully pre-reacted;
[0044] B. After the pre-reaction, add 2.827% silicon dioxide and 14.732% tetraethyl orthosilicate respectively by mass percentage, stir at room temperature for 1 hour, and then add 14.134% with a concen...
Embodiment 3
[0049] Example 3: A surface imprinting material with selective adsorption to nordihydroguaiaretic acid, easy cleaning, and good application performance. The mass percentage of each component required for preparing the imprinting material is: nordihydroguaiaretic acid 0.203 %; γ-Aminopropyltriethoxysilane 1.048%; Methyltriethoxysilane 0.241%; Tetraethyl orthosilicate 16.905%; Silicon dioxide 4.057%; 0.01mol L -1 Acetic acid solution 13.524%; porogen ethanol 64.022%.
[0050] Its preparation method is as follows:
[0051] A. Add 0.203% nordihydroguaiaretic acid, 1.048% γ-aminopropyltriethoxysilane, 0.241% methyltriethoxysilane and 64.022% porogen ethanol to the reaction kettle by mass percentage , stirred at room temperature for 1 hour to make it fully pre-reacted;
[0052] B. After the pre-reaction, add 4.057% silicon dioxide and 16.905% tetraethyl orthosilicate respectively by mass percentage, stir at room temperature for 1 hour, and then add 13.524% with a concentration o...
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