Solid state imaging device, manufacturing method of the same, and electronic equipment

Abstract

A solid state imaging device that includes a phase difference detection pixel which is a pixel for phase difference detection; a first imaging pixel which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel which is a pixel for imaging other than the first imaging pixel. An area of a color filter of the first imaging pixel is smaller than an area of a color filter of the second imaging pixel.

Description

technical field [0001] The present invention relates to a solid-state imaging device, a method of manufacturing the solid-state imaging device, and electronic equipment. In particular, the present invention relates to a solid-state imaging device, a manufacturing method of the solid-state imaging device, and an electronic device capable of suppressing color mixing and sensitivity reduction in pixels for phase difference detection. [0002] Cross References to Related Applications [0003] This application claims the priority of Japanese priority patent application JP2013-257294 filed on December 12, 2013 and Japanese priority patent application JP2014-109412 filed on May 27, 2014, and the above Japanese priority application The entire content of is incorporated herein by reference. Background technique [0004] In recent years, imaging devices such as digital still cameras and digital video cameras that image subjects such as humans or animals and record image data obtaine...

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Problems solved by technology

[0007] However, there are cases where, when the arrangement pitch between color filters is narrow, color mixing and chromatic aberration (color unevenness) occur due to process differences due to displacement occurring during alignment of the photolithography process of the color filters. )

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