Porefilling electroplating leveling agent, preparation method and electroplating liquid using leveling agent

A technology of leveling agent and electroplating solution, which is applied in the field of electroplating solution, hole filling electroplating leveler and its preparation, to achieve excellent hole filling performance and improve the effect of interaction

Active Publication Date: 2015-11-04
SHENZHEN BANMING SCI & TECH CO LTD
View PDF11 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] With the continuous development and progress of information technology, the design of high-density interconnection (HDI) is developing in the direction of more blind holes, smaller hole diameters, and higher aspect ratios of some blind holes. Related processes such as interconnect micro-blind via plating bring great challenges

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Porefilling electroplating leveling agent, preparation method and electroplating liquid using leveling agent
  • Porefilling electroplating leveling agent, preparation method and electroplating liquid using leveling agent
  • Porefilling electroplating leveling agent, preparation method and electroplating liquid using leveling agent

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] Take a 1L double-necked round-bottom flask, equipped with a cold flow reflux tube and a dropping funnel, and add 300mL of deionized water into the flask. At room temperature, 0.5mol of 3-(dimethylamino)-1-propanethiol and 0.5mol of piperazine were successively dissolved in the reaction system, and stirred at room temperature for 10 minutes; (3.3) Add dropwise to the reaction system in the flask from the dropping funnel, and then raise the temperature of the reaction system to 60°C for polymerization; react for 24 hours and cool to room temperature to obtain a yellow viscous solution, which is the hole-filling electroplating leveler.

Embodiment 2

[0048]Take a 1L double-neck round bottom flask, equipped with a cold flow reflux tube and a dropping funnel, and add 300mL of deionized water into the flask. At room temperature, 0.5mol of 3-(dimethylamino)-1-propanethiol and 0.5mol of piperazine were successively dissolved in the reaction system, and stirred at room temperature for 10 minutes; (3.6) Add dropwise to the reaction system in the flask from the dropping funnel, and then raise the temperature of the reaction system to 80°C for polymerization; after 24 hours of reaction, cool to room temperature to obtain a yellow viscous solution, which is the hole-filling electroplating leveler.

Embodiment 3

[0050] Take a 1L double-neck round bottom flask, equipped with a cold flow reflux tube and a dropping funnel, and add 300mL of deionized water into the flask. At room temperature, 0.3mol of 3-(dimethylamino)-1-propanethiol and 0.4mol of piperazine were successively dissolved in the reaction system, and stirred at room temperature for 15 minutes; Compound (3.1) was added dropwise into the reaction system in the flask from the dropping funnel, and then the reaction system was heated to 70°C for polymerization; after 24 hours of reaction, it was cooled to room temperature to obtain a yellow viscous solution, which was the hole-filling electroplating leveler.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a porefilling electroplating leveling agent, a preparation method thereof and an electroplating liquid using the porefilling electroplating leveling agent, and relates to the technical field of electroplating. The porefilling electroplating leveling agent comprises ingredients: 3-(dimethylamino)-1- propanethiol, piperazine and binary epoxy compound, wherein the molar mass ratio of the 3-(dimethylamino)-1- propanethiol, the piperazine and the binary epoxy compound is 1-3: 2-4: 4-6; and the binary epoxy compound has the following structural formula (see in the specification), wherein R is a linking group of a non-epoxy group. According to the porefilling electroplating leveling agent, a functional group containing sulfur atoms is added into leveling agent molecules, so that the interaction between the leveling agent molecules and an accelerator and an inhibitor is improved, the leveling agent, the accelerator and the inhibitor can better interwork, and the prepared electroplating liquid has an excellent porefilling performance.

Description

technical field [0001] The invention relates to the technical field of electroplating, in particular to a hole-filling electroplating leveling agent, a preparation method thereof and an electroplating solution using the hole-filling electroplating leveling agent. Background technique [0002] In recent years, consumer electronic products have become thinner, more integrated, and more multifunctional, requiring printed circuit boards (PCBs) to have the characteristics of high density, high precision, and high reliability, so that they can load more on a limited surface. micro devices. Blind via metallization is an effective means to realize electrical interconnection between layers of Printed Circuit Board (PCB), and it is also one of the key technologies for the development of High Density Interconnection (HDI) boards. HDI is mainly manufactured using the technology of micro-blind holes, which can greatly increase the density and flexibility of wiring on the PCB compared wi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/38C25D7/04
Inventor 罗继业陈威丁杰郝意黄志齐
Owner SHENZHEN BANMING SCI & TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap