Photolithography plate automatic flipping device

Abstract

The invention relates to an automatic turning device for a photolithography mask. The automatic turning device for the photolithography mask comprises a supporting base set, a vertical plate, a driving unit, a driving shaft and a photolithography mask slice box mounted on the driving shaft, wherein photolithography mask bayonets in three specifications for loading any photolithography masks in four-inch, five-inch or six-inch sizes are arranged on the photolithography mask slice box; the driving shaft can be rotated in a reciprocating intermittent form in the area at 0-180 degrees; the photolithography mask slice box is driven to turn by the driving shaft; the front side of the photolithography mask on the photolithography mask slice box is upward under the condition of 0 degree and the rear side of the photolithography mask on the photolithography mask slice box is upward under the condition of 180 degrees; the effect of turning the front and rear sides of the photolithography mask is achieved, so that the purpose of cleaning the front and rear sides of the photolithography mask is achieved through the other technical steps. As an independent mechanism in a photolithography mask washing machine, the automatic turning device is reasonable in structure, low in manufacturing cost, high in operation capacity and high in efficiency; a motor is moved under the control of impulse; the turning operation is stable and accurate; the problem that the rear side of the photolithography mask cannot be cleaned in a full automatic photolithography mask washing machine is solved.

Description

technical field [0001] The invention relates to a photoresist plate cleaning device, in particular to an automatic reversing device for a photoresist plate that reverses both sides of the photoresist plate in the photoresist plate cleaning device. Background technique [0002] The photoresist plate, also known as photomask or photomask, is usually a high-purity precision quartz glass plate with integrated circuit patterns formed by metal chromium. In the manufacture of integrated circuits, photolithography machines are used to project the graphics on the photolithography plate onto silicon wafers or other semiconductor materials. Generally, the production of an integrated circuit chip requires many photolithography plates to be engraved. The photoresist plate is a key tool for the production of integrated circuits. During use, photoresist, dust, fingerprints, etc. will remain on the surface, so it must be cleaned with a photoresist plate cleaning machine. In the traditiona...

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Problems solved by technology

Since the back of the photoresist plate does not have the function of brushing, the cleanliness often fails to meet the requirements. In order to meet the requirements for the cleanliness of the back of the photoresist plate, we have to manually clean the back of the photoresist plate or turn it over by hand and put it into the cleaning machine again. Chamber cleaning

Because the traditional photoresist plate cleaning machine cannot flip the photoresist plate to achieve the effect of cleaning both sides in one process, it not only increases the labor intensity and cleaning time of the photoresist plate, but also directly affects the cleaning quality of the photoresist plate. , thus affecting the product quality of silicon wafers

Chinese Patent Application No. 201110138192.9 provides a "carding device for photomask flushing". The workbench provided in this device is equipped with an opening and closing drive mechanism and an automatic turning mechanism. Although the automatic turning mechanism in this device solves the problem of The automatic flipping of the engraved plate can complete the purpose of cleaning both sides, but the turning device is controlled by a cylinder, and the movement is not stable enough, especially when the movement stops, there is an impact on the photolithographic plate; and the precision of the cylinder to control the rotation is not enough, and the rotation angle has errors

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