Etching method for external layer of thick copper plate
A thick copper plate and etching technology, which is used in chemical/electrolytic methods to remove conductive materials, electrical components, and printed circuit manufacturing. Effect
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[0016] This embodiment provides a method for etching the outer layer of a thick copper plate, the thickness of the bottom copper of the outer layer of the thick copper plate is 3OZ, and the thick copper plate includes a first surface (ie, a TOP surface) and a second surface.
[0017] According to the existing positive film process, the outer layer circuit is made on the thick copper plate, which includes the following processes in turn: grinding plate → film attachment → exposure → development → electroplating copper → electrotin plating → film stripping → outer layer etching → tin stripping.
[0018] 1. Before the outer layer is etched, the pre-process is carried out according to the existing technology, as follows: board entry → bulking → film removal → washing → inspection. The process parameters are as shown in the table below (use the film stripping solution commonly used in this field, such as industrial grade sulfuric acid, industrial grade sodium hydroxide).
[0019] ...
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