A cleaning method after precision polishing of optical components

A technology of optical components and precision polishing, which is applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., to achieve the effects of avoiding ablation damage, high cleanliness, and avoiding secondary pollution

Inactive Publication Date: 2017-05-24
TONGJI UNIV
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are many studies on the cleaning of traditional optical components after processing and before coating, but for components processed on platters and glued on molds, after a long period of precision polishing, how to effectively remove the adhesive on the surface of the components and adhere to the surface and present There are no reports about the cleaning methods of dry-shaped polishing powder particles at home and abroad.

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  • A cleaning method after precision polishing of optical components
  • A cleaning method after precision polishing of optical components
  • A cleaning method after precision polishing of optical components

Examples

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Effect test

Embodiment 1

[0033] Fused silica planar optics processed by platter, cleaned after long time precision polishing.

[0034] 1. Cleaning steps:

[0035] (1) The JGS1 fused silica optical element with a diameter of 25mm and a thickness of 6mm is glued on a quartz optical glue board with a diameter of 190mm and a thickness of 25mm by optical glue method. Gas and fall off the light glue board. Afterwards, classical polishing is carried out, the parabolic powder is ceria parabolic powder, and the polishing cycle is 200 hours. After the optical components are removed from the optical plastic sheet by freezing method, put them into gasoline for immersion. The gasoline is aviation gasoline with less impurities. The immersion time is 40 minutes, and the immersion temperature is room temperature 25°C;

[0036] (2) Place the component in carbon tetrachloride solution and soak for 2.5 hours at a room temperature of 25°C to further remove the polishing powder particles attached to the surface of the c...

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Abstract

The invention relates to a cleaning method for optical elements after precise polishing. The method is especially applied to cleaning K9 glass and fused quartz elements processed through polishing platters by classical methods. The cleaning method includes the specific steps that the optical elements taken down from the platters are soaked in gasoline for over 30 minutes, soaked in carbon tetrachloride for two hours, subjected to ultra-sound treatment for 4-10 minutes in the ultrasound frequency of 40 kHz and 120 kHz successively and washed with 35-45 DEG C deionized water for 30-45 seconds; then the elements are subjected to ultrasound cleaning with an ethanol solution for 4-10 minutes and washed with the 35-45 DEG C deionized water for 30-45 seconds; finally, the elements are subjected to ultrasound cleaning with pure water for 4-10 minutes; and the elements are dried and the required products are obtained. The soaking and ultrasound cleaning methods are combined; organic solvents, inorganic solvents and the deionized water are used as media; the efficiency for cleaning up organic contaminants and polishing powder residual particles on the surfaces of the precisely polished elements is high; acidic and alkaline solutions are not involved in the cleaning process, chemical and physical damages to the surfaces of the elements are avoided, and the damage threshold value under ultraviolet laser irradiation is improved.

Description

technical field [0001] The invention relates to a cleaning method after precision polishing of optical elements, a comprehensive soaking and ultrasonic cleaning method, using organic solvents, inorganic solvents and deionized water as media, especially for platters, K9 glass glued on molds and fused silica optics The components are cleaned after a long period of precise polishing of the bottom plate, which has a high cleaning efficiency for organic pollutants and parabolic powder residues on the surface of the components. The cleaning process does not involve acidic or alkaline solutions, and does not cause chemical and physical damage to the surface of the components. Increased damage threshold under UV laser irradiation. It belongs to the field of optical cold processing. Background technique [0002] The damage threshold of laser components is a key component that limits the output power of UV lasers, and is also one of the key factors to achieve long working life of UV ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B11/00B08B3/08B08B3/12B08B3/02
CPCB08B3/02B08B3/08B08B3/12B08B11/00
Inventor 沈正祥王占山丁涛王晓强马彬
Owner TONGJI UNIV
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