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Array substrate, manufacturing method thereof, and display device

A manufacturing method and array substrate technology, which is applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problem of high manufacturing cost of array substrates, and achieve the effect of reducing production costs

Active Publication Date: 2018-05-22
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of this, the present invention provides an array substrate, a manufacturing method thereof, and a display device to solve the problem of high manufacturing cost of the existing array substrate

Method used

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  • Array substrate, manufacturing method thereof, and display device
  • Array substrate, manufacturing method thereof, and display device
  • Array substrate, manufacturing method thereof, and display device

Examples

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Embodiment Construction

[0049] The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0050] An embodiment of the present invention provides a method for fabricating an array substrate, including the steps of sequentially forming patterns of a thin film transistor, a first insulating layer, a first transparent conductive layer, a second insulating layer, and a second transparent conductive layer, wherein, by patterning once The process forms patterns of the first transparent conductive layer and the second insulating layer.

[0051] Since the patterns of the first transparent conductive layer and the second insulating layer are formed through one patterning process, one mask can be reduced, thereby reducing the production cost.

[0052] In some embodiments of the present invention, the first transparent conductive layer is the layer where the common electrode is located, the second transparent conductive layer is the la...

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Abstract

The invention provides an array substrate, a fabrication method thereof and a display device. The fabrication method of the array substrate, provided by the invention, comprises the step of sequentially forming patterns of a thin film transistor, a first insulation layer, a first transparent conductive layer, a second insulation layer and a second transparent conductive layer, wherein the patterns of the first transparent conductive layer and the second insulation layer are formed by a patterning process in one time. Since the patterns of the first transparent conductive layer and the second insulation layer are formed by the patterning process in one time, a piece of mask can be reduced, and the production cost is reduced.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] At present, thin film transistor liquid crystal display (Thin Film Transistor-Liquid Crystal Display, TFT-LCD for short) according to the display mode can be divided into: twisted nematic (TN, Twisted Nematic) type, plane switching (IPS, In Plane Switching) type and advanced super Dimension field switch (ADS, Advanced Super DimensionSwitch) type. Among them, the ADS type TFT-LCD mainly forms a multi-dimensional electric field through the electric field generated by the edge of the slit electrode in the same plane and the electric field generated between the slit electrode layer and the plate electrode layer, so that the slit electrodes in the liquid crystal cell and the electrodes are positive. All the aligned liquid crystal molecules above can be rotated, thereby imp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L27/12G02F1/1362G02F1/1368
CPCG02F1/136227G02F1/1368H01L27/1214H01L27/1288
Inventor 严允晟
Owner BOE TECH GRP CO LTD