Coating device for solar heat absorbing film

Abstract

The invention discloses a film coating device for solar heat absorption films. The film coating device comprises a plurality of vacuum chambers sequentially connected, wherein the vacuum chambers comprise the feed chamber, the ion treatment chamber, the film coating chambers and the discharge chamber, gas isolation space is reserved in the joint of every two adjacent vacuum chambers, and gas isolation mechanisms are arranged in the gas isolation space respectively. Each gas isolation mechanism comprises a top plate, a transmission roller, a compression roller and a spring, wherein the transmission roller is arranged under the compression roller, a strip base material passes through the joint of the transmission roller and the compression roller, a locating block is arranged on the top surface of the top plate, and the upper part of the compression roller is connected with the locating block through the spring. According to the device, gas isolation chambers in traditional film coating devices are eliminated, and therefore the device structure is simplified, the device manufacture cost is lowered, and air seepage is avoided; a multi-acnode arc target is used in the ion treatment chamber, and the utilization rate of the multi-acnode arc target is higher than that of a traditional single-acnode arc target by more than 10 times; gas guide plates are arranged in the film coating chambers and can change the gas flow direction, the chance for reactant gas to react with ions sputtered by the target is improved, and the film coating effect is effectively improved.

Description

technical field [0001] The invention relates to the technical field of coil coating, in particular to a coating device for a solar heat absorbing film. Background technique [0002] In the traditional production process of solar heat absorbing film, each chamber of the coating device is connected in a linear structure, and the coating method is as follows: figure 1 As shown, after the substrate is unwound and subjected to ion treatment, it is first sent to the air-tight chamber 1 for vacuum treatment, and then sent to the coating chamber 2 for coating. All the materials need to be sent into the air-tight chamber for vacuum treatment, that is, in the coating device, each coating chamber must be equipped with an air-tight chamber at the front end, otherwise the coating effect of the solar heat absorbing film will be affected. The coating device of this method has a huge structure, high cost and high equipment cost. [0003] In addition, in traditional coating devices, single...

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Problems solved by technology

The coating device of this method has a huge structure, high cost and high equipment cost

[0003] In addition, in traditional coating devices, single-point arc targets are generally used for ion treatment of substrates, but in practice, the ionization rate of single-point arc targets is quite low, and it is difficult to clean the substrate surface well, so Coating effect is also poor

[0004] In the coating chamber, since the reactive gas in the coating chamber flows in the same direction, its collision probability is low, so there are few ion reaction opportunities with the sputtering magnetron target, and its coating efficiency is low

At the same time, the current magnetron target uses 3-way magnets to form a circular sputtering runway. The sputtering efficiency of the magnetron target with this structure is low, and the sputtered ions are very limited, so the coating layer formed on the workpiece is also easy. If the thickness does not meet the standard, it generally needs to go through at least several times of repeated coating, which requires the use of multiple continuous coating chambers, which makes the equipment structure large and complex, and the processing cost of the product is high, which is not conducive to improving the market competition of the product force

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