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Bias-voltage adsorption cooling device

A cooling device and access device technology, which is applied in the manufacture of capacitors, electrical components, capacitors, etc., can solve the problem that the cooling effect is not obvious and satisfactory, the cooling effect is limited, and the heat exchange effect between the main drum and the base film surface is not ideal, etc. problem, to achieve significant cooling effect, few changes, and enhance the effect of heat exchange efficiency

Inactive Publication Date: 2016-03-30
JIANGMEN ZHAOYE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the unsatisfactory heat exchange effect between the main drum and the surface of the base film in the prior art, the cooling effect is not obvious and satisfactory, and the cooling effect is limited to a certain extent.

Method used

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  • Bias-voltage adsorption cooling device
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  • Bias-voltage adsorption cooling device

Examples

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Effect test

Embodiment 1

[0013] A bias adsorption cooling device described in Example 1, such as figure 1 As shown, it includes an unwinding shaft 2 wound with a film 1 and the film passes through the rubber roller 3, the guide roller 4, the main drum 5, the first measuring roller 6, the tension roller 7, the second measuring roller 8, the swing arm system 9 and the Rewinding shaft 10; also includes an oil shielding system 11 for spraying the film; the main drum and the tension roller are provided with a carbon brush access device 12, and the carbon brush access device is connected to a 220V DC bias power supply 13 . Since the base film above the metal vapor has to withstand high temperature baking of 1200°C, in order to avoid thermal damage to the base film by the metal vapor, it is necessary to use the mechanical refrigeration method of the main drum to cool the base film, while on the main drum and the tension roller Connecting to a 220V DC bias power supply can enhance the heat exchange efficienc...

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PUM

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Abstract

The invention discloses a bias-voltage adsorption cooling device. The bias-voltage adsorption cooling device comprises an unwinding shaft wound with a thin film, and an oil shielding system which sprays the thin film, wherein the thin film passes through a rubber covered roller, a guide roller, a main drum, a first measuring rod, a tension roller, a second measuring rod, a circling arm system and a winding shaft in sequence, the main drum and the tension roller are each provided with a carbon brush access device, and the carbon brush access devices are connected with a 220V DC bias-voltage power supply. Since a basic film above metallic vapor has to bear 1200 DEG C high temperature braking, in order to prevent thermal damage to the basic film by the metallic vapor, a mechanical cooling method of the main drum is adopted for cooling down the basic film, and the main drum and the tension roller are connected with the 220V DC bias-voltage power supply, so as to enhance heat exchange efficiency of the basic film and the surface of the main drum, and improve the adsorption effect of the basic film on the main drum.

Description

technical field [0001] The invention relates to the technical field of technology for reducing thermal damage of films during the production process, in particular to a bias adsorption cooling device capable of avoiding thermal damage of steam to the base film and improving the adsorption effect of the base film. Background technique [0002] At present, the metallized film is to design multiple disconnected small patterns in the metal area of ​​the film, and divide the metal layer into many small areas connected by very narrow metal channels (miniature fuses). When in use, when excessive self-healing occurs in a small area of ​​the film, the micro-fuse area will be disconnected first due to the small current carrying capacity of the area, so as to ensure the safety of the capacitor and play an explosion-proof role. However, since the metallized film is produced, the base film is located above the metal vapor, and the base film must withstand a high temperature of 1200°C. Th...

Claims

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Application Information

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IPC IPC(8): H01G4/33H01G13/00
Inventor 张德强
Owner JIANGMEN ZHAOYE TECH
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