Dual laterolog equipment, electrode system of dual laterolog equipment and formation resistivity measuring method
A dual laterolog and formation resistivity technology, which is applied in the directions of measurement, earthwork drilling and production, borehole/well components, etc., can solve problems such as difficulty in achieving measurement accuracy and failure to solve the influence of vertical potential gradient
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Embodiment 1
[0060] figure 2 C is the deep laterolog mode synthesized by the high-resolution dual laterolog tool of the present invention. The formation apparent resistivity can be calculated by using the data collected in the above three working modes. as attached figure 2 As shown in C, using the combination of mode 1 and mode 3, the deep lateral apparent resistivity can be obtained:
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[0062] in, is the deep lateral instrument coefficient,
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Embodiment 2
[0069] image 3 C is the shallow laterolog mode synthesized by the high-resolution dual laterolog tool of the present invention. The formation apparent resistivity can be calculated by using the data collected in the above three working modes. as attached image 3 As shown in C, the shallow lateral apparent resistivity can be obtained by using the combination of mode 2 and mode 3:
[0070]
[0071] in, is the shallow lateral instrument coefficient,
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[0073] .
[0074] Using the data collected in the above three working modes, the following high-resolution deep and shallow lateral apparent resistivity curves can also be calculated:
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[0077] in, , are high-resolution deep and shallow lateral instrument coefficients, respectively,
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[0084] .
[0085] In the present invention, electrodes A2 and A2' are short-circuited, electrodes A0 and A0' are short-circu...
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