Dual Laterolog Tool and Its Electrode System, Formation Resistivity Measurement Method
A dual lateral logging, formation resistivity technology, applied in surveying, earthwork drilling, wellbore/well components, etc., can solve the problem of not solving the influence of vertical potential gradient, difficult to achieve measurement accuracy, etc., to shorten the tool The effect of length, improved longitudinal resolution, and improved measurement accuracy
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Embodiment 1
[0060] figure 2 C is the deep laterolog mode synthesized by the high-resolution dual laterolog tool of the present invention. The formation apparent resistivity can be calculated by using the data collected in the above three working modes. as attached figure 2 As shown in C, using the combination of mode 1 and mode 3, the deep lateral apparent resistivity can be obtained:
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[0062] in, is the deep lateral instrument coefficient,
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Embodiment 2
[0069] image 3 C is the shallow laterolog mode synthesized by the high-resolution dual laterolog tool of the present invention. The formation apparent resistivity can be calculated by using the data collected in the above three working modes. as attached image 3 As shown in C, the shallow lateral apparent resistivity can be obtained by using the combination of mode 2 and mode 3:
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[0071] in, is the shallow lateral instrument coefficient,
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[0073] .
[0074] Using the data collected in the above three working modes, the following high-resolution deep and shallow lateral apparent resistivity curves can also be calculated:
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[0077] in, , are high-resolution deep and shallow lateral instrument coefficients, respectively,
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[0085] In the present invention, electrodes A2 and A2' are short-circuited, electrodes A0 and A0' are short-circu...
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