Pixel structure

Abstract

The invention provides a pixel structure comprising a scanning line, a data line, a first bridging line, a second bridging line, a first sub-pixel, a second sub-pixel and a colorful filter layer. The scanning line is arranged between the first and second bridging lines; the first and second sub-pixels respectively comprise a driving element and a pixel electrode; the pixel electrode of the first sub-pixel is arranged between the scanning line and the first bridging line; the pixel electrode of the second sub-pixel is mounted between the scanning line and the second bridging line; the pixel electrode is connected with the driving element via a contact window; each pixel electrode is provided with a first side and a second side corresponding to the first side; the first side of the pixel electrode is adjacent to the scanning line; the contact window is arranged on an edge of the pixel electrode close to the second side; and the colorful filter layer is provided with an opening exposing driving elements of the first and second sub-pixels. The contact window is arranged on the edge of the pixel electrode adjacent to the bridging lines, so a problem that the light-shielding pattern falls due to excessive large size can be overcome.

Description

technical field [0001] The present invention relates to a pixel structure, and in particular to a pixel structure adapted to have smaller dimensions. Background technique [0002] With the vigorous development of display technology, the demand for display panels is gradually moving towards the direction of light and thin, high image quality, and energy saving. In particular, in order to obtain high resolution, more pixels must be laid out in the same area, so the pixel size is getting smaller and smaller, and the pixel wiring method faces more stringent challenges. [0003] Generally speaking, two common lines with different potentials are used to couple with the storage capacitors of the main sub-pixel area and the sub-sub-pixel area in the pixel structure, so that the main sub-pixel area and the sub-sub-pixel area obtain different voltages, and then Improve color cast phenomenon (colorwashout). However, when the above-mentioned wiring method is combined with the manufact...

AI Technical Summary

Problems solved by technology

However, when the above-mentioned wiring method is combined with the manufacturing method in which the color filter film is directly integrated on the TFT array substrate (ColorFilteronArray, COA), it is easy to cause the problem of low aperture ratio.

Images