Orthogonality determination method for direct writing system motion platform

A motion platform and measurement method technology, applied to measurement devices, instruments, optical devices, etc., can solve the problems of long tool cycle, high cost, and difficulty in obtaining testing equipment or testing tools, achieving low cost and fast cycle time. Effect

Active Publication Date: 2016-06-01
SVG TECH GRP CO LTD
7 Cites 11 Cited by

AI-Extracted Technical Summary

Problems solved by technology

[0005] In general, there are two main problems in the current technology: one is that the detection process requires the use of third-party equipment, the tool cycle...
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Abstract

The invention discloses an orthogonality determination method for a direct writing system motion platform. The method comprises the following steps: (1) designing a photolithography file, and forming positioning mark points at four corners; (2) fixing a substrate on the motion platform; (3) carrying out direct writing exposure on the substrate according to the photolithography file; (4) recording XY directions, corresponding to the motion platform, of various sides of the substrate and then carrying out developing, cleaning and drying; (5) rotating the substrate 90 degrees and then fixing the substrate on the motion platform of a direct writing system; (6) moving the motion platform, locating the four positioning mark points at the center positions of a CCD respectively, and recording the corresponding position coordinates; and (7) forming a parallelogram by connection lines of the position coordinates and calculating the orthogonality of the motion platform. Compared with the prior art, third-party equipment or tool is not needed, so that the method disclosed by the invention is short in period, simple, convenient, low in cost and suitable for correction of large-width platforms.

Application Domain

Using optical meansPhotomechanical exposure apparatus +1

Technology Topic

Third partyPhotolithography +3

Image

  • Orthogonality determination method for direct writing system motion platform
  • Orthogonality determination method for direct writing system motion platform
  • Orthogonality determination method for direct writing system motion platform

Examples

  • Experimental program(1)

Example Embodiment

[0027] The preferred embodiments of the present invention will be described in detail below with reference to the drawings.
[0028] In order to achieve the purpose of the present invention, such as Figure 1 to Figure 4 As shown, in one of the embodiments of the present invention, a method for determining the orthogonality of a motion platform of a direct writing system is provided, which is characterized in that it includes the following steps:
[0029] Step 1: Design a lithography file so that the lithography file has positioning marks A, B, C, D on the four corners of its surface;
[0030] Step 2: Fix a blank substrate on the moving platform of the direct writing system;
[0031] Step 3: Perform direct writing exposure on the blank substrate according to the lithography file of Step 1.
[0032] Step 4: Record the XY directions of each side of the exposed substrate corresponding to the moving platform, and then remove the exposed substrate for development, cleaning, and drying;
[0033] Step 5: Rotate the exposed substrate of step 4 by 90°, and then fix it on the moving platform of the direct writing system;
[0034] Step 6: Turn on the illumination light source of the direct writing system, move the moving platform, respectively make the four positioning mark points located at the center of the CCD of the direct writing system, and record the position coordinates (X1, Y1), (X2, Y2), (X3, Y3) and (X4, Y4);
[0035] Step 7: Connect the position coordinates of the motion platform to form a parallelogram, select the positioning mark point close to the zero point of the motion platform, and record the difference between its inner angle and 90° as θ, which is the system's orthogonality angle deviation. When the X axis is the reference, the Y axis needs to be compensated for the angle θ.
[0036] Compared with the prior art, this embodiment does not require third-party equipment and tools, has a fast cycle, simple and convenient, low cost, and is suitable for calibration of large-format platforms.
[0037] In order to further optimize the implementation effect of the present invention, in another embodiment of the present invention, on the basis of the foregoing content, the substrate is fixed on the moving platform of the direct writing system by vacuum adsorption in the above steps 2 and 5 on.
[0038] By adopting the above-mentioned preferred solution, the substrate is fixed by vacuum adsorption, and no additional fixture is needed for fixing, which prevents the fixture from blocking the substrate and affects imaging and improves the accuracy of the measurement.
[0039] In order to further optimize the implementation effect of the present invention, in another embodiment of the present invention, on the basis of the foregoing content, the above-mentioned direct writing system includes a substrate, a moving platform, an exposure device, and an imaging device. The exposure device is based on photolithography. The positioning mark point information of the file performs direct writing exposure on the blank substrate, the imaging device images the positioning mark points on the substrate according to the exposed substrate, and the exposure device and the molding device are integrated.
[0040] Using the above-mentioned preferred solution, the exposure device and the molding device are integrated, and the exposure of the positioning mark points on the substrate and the position coordinates of the positioning mark points on the moving platform can be completed on one device, so as to calculate the orthogonality of the moving platform , Save the space occupied by the equipment, faster and more convenient, and maximize efficiency.
[0041] The above are only the preferred embodiments of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the inventive concept of the present invention, a number of modifications and improvements can be made, which belong to the present invention. The scope of protection of the invention.

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