Orthogonality determination method for direct writing system motion platform
A motion platform and measurement method technology, applied to measurement devices, instruments, optical devices, etc., can solve the problems of long tool cycle, high cost, and difficulty in obtaining testing equipment or testing tools, achieving low cost and fast cycle time. Effect
Active Publication Date: 2016-06-01
SVG TECH GRP CO LTD
7 Cites 11 Cited by
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Abstract
The invention discloses an orthogonality determination method for a direct writing system motion platform. The method comprises the following steps: (1) designing a photolithography file, and forming positioning mark points at four corners; (2) fixing a substrate on the motion platform; (3) carrying out direct writing exposure on the substrate according to the photolithography file; (4) recording XY directions, corresponding to the motion platform, of various sides of the substrate and then carrying out developing, cleaning and drying; (5) rotating the substrate 90 degrees and then fixing the substrate on the motion platform of a direct writing system; (6) moving the motion platform, locating the four positioning mark points at the center positions of a CCD respectively, and recording the corresponding position coordinates; and (7) forming a parallelogram by connection lines of the position coordinates and calculating the orthogonality of the motion platform. Compared with the prior art, third-party equipment or tool is not needed, so that the method disclosed by the invention is short in period, simple, convenient, low in cost and suitable for correction of large-width platforms.
Application Domain
Using optical meansPhotomechanical exposure apparatus +1
Technology Topic
Third partyPhotolithography +3
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