XY stage, alignment device, and vapor deposition device
A technology for aligning devices and workbenches, applied in lighting devices, vacuum evaporation coatings, sputtering coatings, etc., can solve the problems of increased types of components, increased manufacturing costs, and large motor loads to maintain alignment accuracy , to achieve the effect of cost reduction
Active Publication Date: 2016-06-01
ULVAC INC
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Problems solved by technology
However, in this case, since the mass of the table is increased, the load applied to the motor provided on the lower table among the stacked tables is larger, so the positioning accuracy of the lower table is lower than that of the upper table. poor problem
In addition, in order to solve this problem, in the case of adopting a motor that can withstand a large load to the lower stage, the manufacturing cost increases due to the increase in the number of parts in the device structure.
In addition, since the actuators in the X-axis direction and the Y-axis direction are simultaneously driven during alignment, it is necessary to adjust the control of the upper stage and the lower stage for the control of the actuators, and even the control software has a heavy burden. large and thus unrealistic
Method used
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[0043] Next, the XY stage, the alignment device, and the vapor deposition device according to the first embodiment of the present invention will be described based on the drawings.
[0044] figure 1 is a perspective view showing the XY stage according to this embodiment, figure 2 It means perspective figure 1 The perspective view of the XY table according to this embodiment of the table in FIG.
[0045] Such as figure 1 As shown, the XY table 10 involved in this embodiment has: a base 11; a table 12; and supporting driving parts 13, 14, 15, 16, which are located between the base 11 and the table 12 and drive the work in the XY direction Taiwan 12.
[0046] Both the base 11 and the workbench 12 are formed by boards, wherein the two boards are formed of rectangular frame-like structures with approximately the same shape and outline when viewed from above. In the table 12, one side of a rectangle which is four sides 12a, 12b, 12c, and 12d of a rectangle can be set to about ...
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This XY stage is provided with a plurality of support units that include: support driving parts (13, 14, 15, 16) which are disposed between a base (11) and a stage (12) and which drive the stage (12) in the X and Y directions; a first guide member which is disposed on the base (11) and is straight; a first plate member which is placed and held on the first guide member and which can move in a first guide direction in which the first guide member extends in the in-plane direction of the stage (12); a second guide member which is placed and held on the first plate member and which extends in a second guide direction that is an in-plane direction of the stage (12) orthogonal to the first guide direction; and a second connection part which is placed and held on the second guide member, provided fixed integrally with the stage (12), and moveable in the second guide direction. The plurality of support driving parts (13, 14, 15, 16) are positioned so as to be opposing in the first and second guide directions, are disposed on the edges of the stage (12), and are provided with drive devices (13f, 15f) which are disposed on at least one edge from between opposing edges and which are connected to the first plate member and the second connection part. The first plate member and the second connection part can be relatively driven in the second guide direction.
Description
technical field [0001] The invention relates to an XY workbench, an alignment device and a vapor deposition device, in particular to a technique suitable for manufacturing organic EL elements or FPDs. [0002] this application claims priority based on Japanese Patent Application No. 2014-197436 for which it applied to Japan on September 26, 2014, and uses the content here. Background technique [0003] In the manufacture of organic EL elements and FPDs (flat panel displays), etc., patterning is performed on a substrate with high precision using a vapor deposition mask to form a plurality of stripe-shaped thin film patterns. At this time, it is required to precisely align the substrate to be vapor-deposited with the position and rotation angle of two degrees of freedom in the horizontal direction. As shown in Patent Document 1, in order to satisfy the precision of such position control, an apparatus using interference drive having three drive shafts called a UVW stage is use...
Claims
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IPC IPC(8): C23C14/50H01L51/50H05B33/10
CPCC23C14/50H05B33/10H01L21/682H10K71/00C23C14/042C23C14/243C23C14/54H10K71/16
Inventor 佐藤诚一
Owner ULVAC INC