PECVD gas shower head, film forming chamber and working method
A gas shower head and film-forming cavity technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of reduced dissociation efficiency, slow cleaning speed, etc. Improved uniformity, high commercial value
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0031] The present invention will be described in detail below with reference to the specific embodiments shown in the drawings.
[0032] figure 1 Shown is a schematic structural view of a PECVD film forming chamber in an embodiment of the present invention. The PECVD film forming chamber includes an upper electrode 10, a lower electrode 20, and a cavity 30. The upper electrode 10 is connected to a radio frequency power supply and forms a plasma discharge area 40 between the upper electrode 10 and the lower electrode 20. This area is the film forming area of the PECVD film forming chamber. The upper surface 11 of the upper electrode is connected to the top wall of the cavity. The distance range of the inner surface 31 is less than or equal to 3 mm to prevent the generation of parasitic plasma.
[0033] The upper electrode 10 is also connected to a gas source. The gas source includes process gas or cleaning gas for supplying the required gas to the plasma discharge area. Therefore...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap