Flexible pressure sensor and preparation method thereof
A pressure sensor and flexible technology, applied in the field of sensors, can solve the problems of poor stability and limited sensitivity improvement, and achieve the effects of preventing deformation, improving sensitivity, and overcoming high cost
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[0028] A method for preparing a flexible pressure sensor specifically includes the following steps:
[0029] Step 1. Preparation of the first micro-nano structure PDMS film and the first CNT film: a) Cut a 6-inch silicon wafer into 3cm×3cm size, and then ultrasonically clean in acetone and ethanol for 15-30 minutes, and then use deionized water Rinse and dry with nitrogen; b) Place the silicon wafers cleaned and dried in the previous step in the vacuum chamber of the three-dimensional mobile platform, and SF is passed into the vacuum chamber 4 After gas, the energy density is 0.42J / cm 2 , The number of pulses is 612.5, and the femtosecond laser with energy of 0.1mJ performs scanning and ablation at a speed of 1mm / s to obtain black silicon. The SEM image is as follows figure 2 As shown; c) the black silicon obtained in the previous step was ultrasonically cleaned in acetone, absolute ethanol and deionized water for 15-30 minutes, dried by nitrogen, and immersed in TMCS (trimethylchl...
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[0033] Example
[0034] A method for preparing a flexible pressure sensor specifically includes the following steps:
[0035] Step 1. Prepare the first micro-nano structured PDMS film and the first CNT film: a) Cut a 6-inch silicon wafer into 3cm×3cm size, and then ultrasonically clean it in acetone and ethanol for 15 minutes, and then rinse with deionized water. Nitrogen drying; b) Place the silicon wafers cleaned and dried in the previous step in the vacuum chamber of the three-dimensional mobile platform, and SF is passed into the vacuum chamber 4 After gas, the energy density is 0.42J / cm 2 , The number of pulses is 612.5, and the femtosecond laser with energy of 0.1mJ performs scanning and ablation at a speed of 1mm / s to obtain black silicon. The SEM image is as follows figure 2 As shown; c) The black silicon obtained in the previous step was ultrasonically cleaned in acetone, absolute ethanol and deionized water for 15 minutes. After drying with nitrogen, it was immersed in TMC...
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