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Titanium nitride deposition system

A deposition system, titanium nitride technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of waste machine capacity, long preventive maintenance time, etc., to reduce the required time, The effect of improving machine utilization

Inactive Publication Date: 2016-07-27
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Abstract
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Problems solved by technology

In this way, the progress of the entire preventive maintenance process is delayed, resulting in a long time required for the entire preventive maintenance and wasting machine capacity.

Method used

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Embodiment Construction

[0018] The following will combine Figure 2 to Figure 4 The titanium nitride deposition system provided by the present invention is described in detail, which is an optional embodiment of the present invention. It can be considered that those skilled in the art can modify and modify it within the scope of not changing the spirit and content of the present invention. polish.

[0019] Please refer to figure 2 , the present invention provides a titanium nitride deposition system, including a chamber assembly 1 and a carrying arm 2, and the chamber assembly 1 is detachably mounted on the carrying arm 2.

[0020] The present invention enables detachable installation between the carrying arm 2 and the chamber assembly 1, so that during maintenance, the entire chamber assembly (ChamberLid) can be dismantled as a whole, and the assembly time and the cleaning time of the gas box (GasBox) etc. Putting it out of the preventive maintenance process, thereby reducing the time required fo...

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Abstract

The invntion provides a titanium nitride deposition system. The titanium nitride deposition system comprises a cavity module and a bearing arm; and the cavity module is detachably mounted on the bearing arm. As the bearing arm and the cavity module are detachably mounted, the whole cavity module (Chamber Lid) can be dismounted during maintaining, the assembly time and the cleaning time of a gas box (Gas Box) and the like are excluded by the preventive maintenance process, the needed preventive maintenance time is shortened, and the stand utilization rate is improved.

Description

technical field [0001] The invention relates to semiconductor process equipment, in particular to a titanium nitride deposition system. Background technique [0002] Under the existing circumstances, in the preventive maintenance process of the titanium nitride deposition chamber of AMATEnduraIITxZChamber, because the chamber assembly (ChamberLid assembly) cannot be dismantled as a whole, it is necessary to disassemble the entire chamber assembly (ChamberLid assembly) into the smallest components. Completely remove the chamber assembly (ChamberLid assembly). [0003] Please refer to figure 1 , The cavity assembly (ChamberLid assembly) includes the gas chamber (GasBox), the isolator (LidIsolator), the shower head (ShowerHead), the blocking plate (BlockerPlate) and the sealing ring (O-Ring), so that the next step can be performed. Moreover, the gas box (GasBox) needs to be soaked and wiped with hydrogen peroxide before it can continue to be used. In this way, the progress o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/34
CPCC23C16/303
Inventor 万成邰晓东柳小敏刘玮
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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