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Indium oxide layer etchant composition and method for manufacturing array substrate of liquid crystal display device using same

A technology for liquid crystal display devices and array substrates, which is applied in the fields of chemical instruments and methods, surface etching compositions, semiconductor/solid-state device manufacturing, etc., and can solve the problems of lower layer damage, low lateral etching rate, and small side etching amount, etc.

Active Publication Date: 2018-12-11
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when sulfate and acetate are included in the etching composition, the lateral etch rate is low, resulting in a small amount of side etch and the problem of underlying damage

Method used

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  • Indium oxide layer etchant composition and method for manufacturing array substrate of liquid crystal display device using same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to 3 and comparative example 1 to 10

[0048] The indium oxide layer etchant compositions of Examples 1 to 3 and Comparative Examples 1 to 10 were prepared with the compositions shown in Table 1 below, and included the balance of water so that the total weight became 100% by weight.

[0049] 【Table 1】

[0050] (weight%)

[0051]

nitric acid

BTA

ABF

potassium sulfate

Ammonium acetate

potassium chloride

ammonium nitrate

sulfuric acid

Example 1

8

1.0

0.1

-

-

-

-

-

Example 2

15

1.5

0.1

-

-

-

-

-

Example 3

10

0.7

1.0

-

-

-

-

-

Comparative example 1

2

1.0

0.1

-

-

-

-

-

Comparative example 2

35

1.0

0.1

-

-

-

-

-

Comparative example 3

7

0.05

0.1

-

-

-

-

-

Comparative example 4

7

12

0.05

-

-

-

-

-

Comparative example 5

9

0.5

7

-

-

-

-

-

...

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Abstract

The invention relates to an indium oxide layer etchant composition and a method for using it to manufacture an array substrate of a liquid crystal display device. More specifically, it relates to a composition that does not include sulfate or acetate but includes nitric acid, azole compounds, and fluorine-containing compounds. An indium oxide layer etchant composition of water and water, and a method for manufacturing an array substrate of a liquid crystal display device using the composition.

Description

technical field [0001] The invention relates to an indium oxide layer etchant composition and a method for using it to manufacture an array substrate of a liquid crystal display device. More specifically, it relates to a composition that does not include sulfate or acetate but includes nitric acid, azole compounds, and fluorine-containing compounds. An indium oxide layer etchant composition of water and water, and a method for manufacturing an array substrate of a liquid crystal display device using the composition. Background technique [0002] Liquid crystal display devices (LCDs) are most popular among flat panel display devices because they provide clear images with excellent resolution, consume less power, and enable thinner display screens. Typical electronic circuits driving such liquid crystal display devices today are thin film transistor (TFT) circuits, and a typical thin film transistor liquid crystal display device (TFT-LCD) forms the pixels of the display screen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09K13/08G02F1/13G02F1/1362
CPCC09K13/08G02F1/1303G02F1/136286G02F1/136295C09K13/06C23F1/18G02F1/1333H01L21/30604
Inventor 权五柄郑敬燮金相泰朴镛云李恩远李智娟崔容硕
Owner DONGWOO FINE CHEM CO LTD
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