A Method for Determining the Optimal Arc Edge of Space Regular Polygon Plane Thin Film Structure

A regular polygon and film structure technology, which is applied in the field of determining the optimal arc edge of a space regular polygon plane film structure, can solve the problems such as the inability to guarantee the maximum effective area without wrinkles, and the quantitative analysis of the cutting shape of the arc edge is not given.

Active Publication Date: 2018-10-30
XIDIAN UNIV
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This structure can reduce wrinkles without increasing the quality of the film structure, but there is no quantitative analysis of the arc cutting shape, and it cannot guarantee the maximum effective area without wrinkles

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Method for Determining the Optimal Arc Edge of Space Regular Polygon Plane Thin Film Structure
  • A Method for Determining the Optimal Arc Edge of Space Regular Polygon Plane Thin Film Structure
  • A Method for Determining the Optimal Arc Edge of Space Regular Polygon Plane Thin Film Structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0106] The invention provides a method for determining the optimal arc edge of a space regular polygon planar film structure, comprising the following steps and contents:

[0107] (1) Determination of the radius of the wrinkled region when the regular polygonal membrane structure is subjected to an equivalent angular tension

[0108] for figure 1 As shown in the traditional stress field hypothetical model, the circumcircle radius is R m , its inscribed regular polygonal film structure is an isotropic linear elastic body, half of the side length is R, the number of sides of the regular polygon is n, Young's modulus is E, Poisson's ratio is v, when subjected to When the equivalent angular tension T is applied, the corner area is only subject to radial stress, and the central area is subject to uniform bidirectional stress. According to the judgment condition of the wrinkle state, when the second principal stress is negative in the corner region subjected to unidirectional stre...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an optimal arc side determining method for a spatial regular-polygon plane membrane structure. The optimal arc side determining method comprise the steps that firstly, for a straight-sided regular-polygon membrane structure stressed with equivalent angle tension, the fold area radius and the fold morphological parameters of the straight-sided regular-polygon membrane structure are determined; secondly, for the regular-polygon arc side structure, the optimal arc side shape is obtained according to a stress field hypothesis model. According to the method, the stress distribution theory is used for determining the fold area radius, the fold morphological parameters including the fold amplitude value, the fold number and the fold semi-wavelength are deduced through a hypothesis fold morphological description equation and a strain compatible equation, and thus the rule that the fold area and the fold amplitude value are decreased along with increase of the number of the sides of the regular-polygon membrane structure can be obtained. On the basis, the arc side structure is introduced to reduce folds, and the stress field hypothesis model suitable for the regular-polygon arc side structure is proposed, so that the optimal arc side determining method is given, the maximum effective area without folds is ensured, and the surface precision of a membrane is improved.

Description

technical field [0001] The invention belongs to the field of mechanical engineering, in particular to a method for determining the optimal arc edge of a space regular polygon plane film structure, which is used for reducing film surface wrinkles and improving surface precision. Background technique [0002] Due to the advantages of light weight, small storage volume, low cost, and easy folding, thin film materials have broad application prospects in the fields of spaceborne large-aperture array antennas, space solar power plant concentrators, and solar sails. However, due to the small bending stiffness of the film, it is easy to generate local instability and cause wrinkles when subjected to external loads. The appearance of wrinkles will reduce the shape and surface accuracy of the film, resulting in a sharp decline in optical and electrical properties. Therefore, effectively suppressing wrinkles and improving surface precision have become urgent problems to be solved. Sch...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50
CPCG06F30/20
Inventor 刘明君黄进王雅丽
Owner XIDIAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap