A high-efficiency diffusion furnace for silicon wafers

Abstract

The invention discloses a high-efficiency diffusion furnace for silicon wafers, which comprises a furnace body and a furnace door. A quartz boat is arranged in the furnace body, an air inlet is opened on the upper end of the furnace body, and the air inlet is connected with an air inlet pipe. There is a gas outlet, and the gas outlet is connected to the exhaust gas discharge pipe. There is a furnace door at the furnace mouth of the furnace body. The center of the furnace door is provided with a rotating shaft. A window symmetrical to the rotating shaft, a quartz stopper matching the window is also provided at the furnace mouth of the furnace body, a U-shaped bracket is fixed on the outside of the furnace body, and the first telescopic cylinder, The second telescopic cylinder, the third telescopic cylinder, and the first telescopic cylinder and the second telescopic cylinder are respectively close to the protrusions, and the third telescopic cylinder is connected to the quartz push-pull rod. The structure principle of the invention is simple, the operation is convenient, and the automatic opening and closing of the furnace door can be realized. , Automatically enter and exit the quartz boat, with a high degree of automation and improved work efficiency.

Description

technical field [0001] The invention relates to the technical field of silicon wafer processing of solar cells, in particular to a high-efficiency diffusion furnace for silicon wafers. Background technique [0002] Solar cells need a large-area PN junction to convert light energy into electrical energy, and the diffusion furnace is a special equipment for manufacturing the PN junction of solar cells. The diffusion furnace generally includes a furnace body with a furnace door, a quartz boat in the furnace body, and a silicon chip placed on the quartz boat. The furnace body is equipped with an inlet pipe for diffusing gas into the furnace body and a discharge pipe for exhaust gas after diffusion treatment. , the exhaust pipe is connected with an exhaust fan, and the liquid source of phosphorus oxychloride is generally used as a diffusion source for diffusion. The P-type silicon wafer is placed in the quartz boat of the diffusion furnace, and the trichlor The oxyphosphorus is ...

AI Technical Summary

Problems solved by technology

[0004] Because the furnace door of the diffusion furnace is usually heavy, it is difficult to open or close manually. In order to put the silicon wafer into the furnace body and take it out from the furnace body, a switch device for opening or closing the furnace door is usually provided on the furnace door. , the existing switchgear includes a forward motor and a rotary motor, the forward motor is used to contact and separate the furnace door from the furnace body, and the rotary motor is used to rotate the furnace door to the side of the furnace mouth, giving way to the furnace body. Space, the forward motor is connected to the furnace door through a push-pull rod, and the rotating motor is connected to the furnace door through a rotating rod. During the use of this switch device, there are the following problems: the switch device with this structure, the rotating motor and the furnace door The door is located at both ends of the rotating rod, which makes the rotating motor need to provide a large rotating torque to make the furnace door rotate. The rotating motor bears a large rotating torque and the load on the motor is relatively large, so it is easy to burn out the rotating motor. The service life of the rotating motor is short, and the motor needs to be replaced frequently, which not only affects the normal production, but also greatly increases the production cost. In addition, the existing diffusion furnace cannot automatically rotate the furnace door and automatically enter and exit the quartz boat at the same time, resulting in low work efficiency

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