Light beam transverse micro-displacement generation system based on spin Hall effect of light and MIM structure

A technology of Hall effect and lateral displacement, applied in the direction of using optical devices, material analysis through optical means, measuring devices, etc., can solve the problems that the reflection coefficient is difficult to approach zero, the influence ratio, and the TE light reflection coefficient are not high, and achieve Enhanced spin Hall effect, easy to adjust the effect

Inactive Publication Date: 2016-10-12
HOHAI UNIV CHANGZHOU
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Problems solved by technology

[0007] The disadvantage of the first structure above is that the reflection coefficient of TE light is not high, about 0.2 to 0.3, thus affecting the ratio
The defect of the second structure lies in the excitation of surface plasmon waves. Due to factors such as loss, the reflection coefficient is also difficult to approach zero.
Unfortu

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  • Light beam transverse micro-displacement generation system based on spin Hall effect of light and MIM structure
  • Light beam transverse micro-displacement generation system based on spin Hall effect of light and MIM structure
  • Light beam transverse micro-displacement generation system based on spin Hall effect of light and MIM structure

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[0032] In order to make the technical means, creative features, objectives and effects of the present invention easy to understand, the present invention will be further explained below in conjunction with specific embodiments.

[0033] Utilizing the polarization correlation characteristics of the guided mode excitation of the MIM waveguide structure, one polarization meets the phase matching condition, and the amplitude of its reflection coefficient approaches zero, while the other polarization has a high reflection coefficient amplitude. Under this condition, according to the optical spin Hall effect, lateral displacement of the order of sub-millimeter or even millimeter can be generated. Because the guided mode excitation conditions of MIM are closely related to the wavelength, polarization, incident angle and structural parameters of the MIM waveguide, adjusting any parameter can modulate the lateral displacement of the beam.

[0034] The MIM waveguide structure is a three-laye...

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Abstract

The invention discloses a light beam transverse micro-displacement generation system based on a spin Hall effect of light and an MIM structure. The system comprises a laser, a polaroid, an MIM optical waveguide, a CCD, a photodiode and a displayer, wherein the polaroid, the MIM optical waveguide, and the CCD are sequentially arranged on a light path of the laser; the portions, on the two sides of the polaroid, of the light path are further provided with a first small hole aperture and a second small hole aperture, and the MIM optical waveguide is installed on an angle rotating table; a guided mode of the MIM optical waveguide can be excited only when TE polarization or TM polarization phase matching conditions are met, after the guided mode is excited, the reflectivity is reduced to zero by selecting various condition parameters, the angle rotating table stops moving, and an incident angle is fixed; by modulating the polarization direction of the polaroid, in one polarization state, reflected light is divided into two beams of circularly polarized light, and in the other polarization state, the reflected light is not divided. According to the light beam transverse micro-displacement generation system based on the spin Hall effect of light and the MIM structure, the spin Hall effect of the light can be enhanced, a large transverse displacement is generated, and meanwhile adjustment can be conducted conveniently by means of multiple parameters.

Description

technical field [0001] The invention relates to a light beam lateral micro-displacement generating system based on the optical spin Hall effect and a MIM structure, and belongs to the technical field of guided wave optics and laser measurement. Background technique [0002] The micro-displacement of the light beam, especially the micro-displacement from micron to submillimeter, plays an extremely important role in the design of high-precision optical instruments, such as optical logic devices, all-optical chips, and even future optical brains. However, this level of micro-displacement is difficult to achieve precisely by mechanical means. In many cases, such as in all-optical chips, due to the miniaturization of devices, mechanical means are not allowed. Therefore, it is very useful to use non-mechanical means to realize the micro-displacement of the beam and to effectively modulate it. [0003] At present, there are two main methods to form the micro-displacement of the be...

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Application Information

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IPC IPC(8): G01N21/01G01B11/02
CPCG01B11/02G01N21/01G01N2201/06113G01N2201/0683G01N2201/08
Inventor 殷澄姜学平贾静韩庆邦
Owner HOHAI UNIV CHANGZHOU
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