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Color film substrate and manufacturing method thereof

A technology for color filter substrate and base substrate, which is applied to instruments, optics, static indicators, etc., can solve the problems of high cost, limited improvement of the color gamut of display devices, and complicated manufacturing process of color filter substrates.

Inactive Publication Date: 2016-11-09
BOE TECH GRP CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Embodiments of the present invention provide a color filter substrate and a manufacturing method thereof, which are used to solve the problems in the prior art that the manufacturing process of the color filter substrate is complicated and costly, and the improvement of the color gamut of the display device is limited by the color filter substrate on the color filter substrate. Problems with color film resin layer materials

Method used

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  • Color film substrate and manufacturing method thereof
  • Color film substrate and manufacturing method thereof
  • Color film substrate and manufacturing method thereof

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Embodiment Construction

[0041] The specific implementation of the color filter substrate provided by the embodiments of the present invention and the manufacturing method thereof will be described in detail below with reference to the accompanying drawings.

[0042] An embodiment of the present invention provides a color filter substrate, such as image 3 As shown, it may include: an optical film layer 02 located in each pixel area on the base substrate 01 and not completely covering the pixel area, a black matrix 04 surrounding each pixel area, and a protective layer 03 covering the black matrix 04 and each pixel area ; Among them, the optical film layer 02 and the protective layer 03 are used to change the phase of light.

[0043] The above-mentioned color filter substrate provided by the embodiment of the present invention covers but not completely covers an optical film layer in the pixel area, so that the light emitted from the pixel area has a different optical path. When light of certain wavel...

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Abstract

The invention discloses a color film substrate and a manufacturing method thereof. The color film substrate comprises: an optical film layer which is in each pixel region on a substrate base plate and does not completely cover the pixel region, a black matrix surrounding each pixel region, and a protective layer covering the black matrix and each pixel region. The optical film layer and the protective layer are used to change phase of light. Thus, the optical film layer is covered but not completely covered on the pixel region, light rays emitting from the pixel region have different optical distances. When light in certain wavelength passes through the color film substrate, the part passing through the optical film layer and the part not passing through the optical film layer have phase difference, that is, light rays passing through the two regions have different phase changes, and thus light rays are overlaid to reinforce or overlaid to cancel, so that light rays in certain wavelengths cannot pass through the color film substrate. Through adjusting the thickness of the optical film layer, red light, green light, and blue light passing through the color film substrate can be respectively realized.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a color filter substrate and a manufacturing method thereof. Background technique [0002] With the development of display technology, improving the color gamut of display devices has become a trend in the development of display technology. The preparation process of the traditional color filter substrate is very complicated and the cost is too high. figure 1 It is a schematic diagram of the structure of the color filter substrate in the prior art. Due to the limitations of the resin layer (including three colors of R, G, and B resin materials) on the color filter substrate itself, the peak width of the light after passing through the color filter resin layer is relatively small. wide, such as figure 2 As shown, the peak width of the red light R after passing through the resin layer on the color film is as high as 200nm, and the peak width is relatively wide, so the color gam...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335
CPCG02F1/133512G02F1/133514G02F1/133516G02F1/133519G02F1/13363G02B5/201G02B5/3025G02B5/288G02F1/133631G02B5/28G09G3/2003
Inventor 李小龙王宇鹏田超张洪术贺宏
Owner BOE TECH GRP CO LTD
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