Lithography system

Abstract

The invention discloses a photoetching system. The photoetching system comprises a light source as well as a spatial light modulator, a first beam splitting device, a bi-telecentric optical system and a photoetching platform which are sequentially arranged along the direction of a light path, wherein the bi-telecentric optical system comprises a lens cone lens and an objective lens which are sequentially arranged along the direction of the light path, lights between the lens cone lens and the objective lens are non-parallel lights, the objective lens is connected with a focus adjustment device, and the focus adjustment device drives the objective lens to move so as to realize focus adjustment. The photoetching system at least has the advantages that no beam splitting device is arranged in a main light path, so that the imaging quality is good; a detection system consists of optical imaging components, so that the size of a detection light spot projected to the surface of a workpiece is relatively large and is unlikely to be influenced by dust and particles; and the detection system and a focus adjustment system adopt a mechanical switching mode, the structure of the light path is simple, and the operation is convenient.

Description

technical field [0001] The invention relates to a micro-nano processing device, in particular to a photolithography system, which is applied to research and manufacturing fields such as precision mask photolithography, MEMS devices, 3D photolithography, diffractive optics, and micro-optics. Background technique [0002] Chinese Patent No. 201010170978.4 discloses a parallel lithography direct writing system, which includes a light source, a pattern generation system, an optical system, a control system, a motion system, and a workpiece platform, and is characterized in that a focus servo system is also provided, and the The focus servo system includes a detection optical path, a sensor and a focusing device. The optical system is composed of a miniature system and a detection optical path. The first spectroscopic device, the second spectroscopic device between the detection light source and the first spectroscopic device, the detection light enters the bi-telecentric optical...

AI Technical Summary

Problems solved by technology

[0004] 1. The image quality is not ideal

In the prior art, a spectroscopic device is inserted into the main optical path composed of a light source, a spatial light modulator, a part of the emitting mirror, and an objective lens. It is inevitable to introduce certain aberrations

The main reason is that in the bi-telecentric optical path (used in ), the light beams are not parallel between the front and rear lens groups, and the insertion of optical elements (prisms, phase plates, dichroic mirrors, etc.) can cause beam shift and contrast degradation, especially in When the distance between the front and rear lens groups is small

[0005] 2. Poor reliability of servo focusing

[0006] 3. Complex optical path structure

Images