Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for fixing patterns in magnetic field

A fixing method and pattern technology, applied in the adhesive field, can solve the problems of pattern fidelity and precision loss

Active Publication Date: 2016-12-21
BEIJING UNIV OF CHEM TECH
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the process of adhering the pattern in the ordinary adhesive method, the fidelity and precision of the pattern will be lost to a certain extent, so here we propose a method that uses light-curing adhesive oxygen inhibition and secondary curing in a protective gas atmosphere. Advanced technology can effectively maintain the precision and accuracy of the pattern fixing process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for fixing patterns in magnetic field
  • Method for fixing patterns in magnetic field
  • Method for fixing patterns in magnetic field

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Such as figure 1 As shown, the invention provides a method for fixing patterns in a magnetic field, comprising the following steps:

[0020] Please refer to FIG. 2a, step S1, coating a layer of adhesive on the surface of the substrate, and irradiating the adhesive in a pure oxygen atmosphere to cure the adhesive for the first time. In this example, the substrate 01 is polyimide film. Adhesive 02 is epoxy acrylic resin based adhesive. The initiator is 1173, and the first curing of the adhesive layer is achieved by exposing for 1 min. Use mercury lamp exposure in the present embodiment, light intensity is 30mW / cm 2 . Test the tackiness of the adhesive with finger pressure, leaving an indentation.

[0021] Please refer to FIG. 2 b , step S2 , using a magnetic field patterning method to form a magnetic particle pattern on the surface of the adhesive layer on the substrate. In this example, the magnetic particles are Fe nanoparticles, and the pattern is a line pattern ...

Embodiment 2

[0024] Such as figure 1 As shown, the invention provides a method for fixing patterns in a magnetic field, comprising the following steps:

[0025] Please refer to Figure 2a, step S1, coating a layer of adhesive on the surface of the substrate, and irradiating the adhesive in an atmosphere with an oxygen volume fraction of 80% and a nitrogen gas fraction of 20% to cure the adhesive for the first time . In this example, the substrate 01 is polyimide film. Adhesive 02 is epoxy acrylic resin based adhesive. The initiator is 1173, and the first curing of the adhesive layer is achieved by exposing for 1 min. Mercury lamp is used in this embodiment, and the light intensity is 30mW / cm 2 . Use mercury lamp exposure in the present embodiment, light intensity is 30mW / cm 2 . Test the tackiness of the adhesive with finger pressure, leaving an indentation.

[0026] Please refer to FIG. 2 b , step S2 , using a magnetic field patterning method to form a magnetic particle pattern on t...

Embodiment 3

[0029] Such as figure 1 As shown, the invention provides a method for fixing patterns in a magnetic field, comprising the following steps:

[0030] Please refer to Figure 2a, step S1, coating a layer of adhesive on the surface of the substrate, and irradiating the adhesive in an atmosphere with an oxygen volume fraction of 60% and a nitrogen gas fraction of 40% to cure the adhesive for the first time . In this example, the substrate 01 is polyimide film. Adhesive 02 is epoxy acrylic resin based adhesive. The initiator is 1173, and the first curing of the adhesive layer is achieved by exposing for 1 min. Use mercury lamp exposure in the present embodiment, light intensity is 30mW / cm 2 . Use mercury lamp exposure in the present embodiment, light intensity is 30mW / cm 2 . Test the tackiness of the adhesive with finger pressure, leaving an indentation.

[0031] Please refer to FIG. 2 b , step S2 , using a magnetic field patterning method to form a magnetic particle pattern ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for fixing patterns in a magnetic field and relates to the field of gluing methods. The method is based on the characteristic that a photo-curing adhesive has oxygen inhibition in the oxygen atmosphere, and a viscous layer, caused by oxygen inhibition, on the surface of the adhesive is used for adhering to the magnetic particle patterns formed in the magnetic field. The adhesive is illuminated in the oxygen atmosphere firstly, the viscous layer is formed on the surface of the adhesive due to oxygen inhibition, the viscous layer is used for adhering to the patterns formed by magnetic particles in the magnetic field, the adhesive is illuminated again in the protective gas atmosphere, the viscous layer on the surface of the adhesive is cured, and therefore the patterns of the magnetic particles are fixed to a base material. According to the method for fixing the patterns in the magnetic field, by making full use of the technology of oxygen inhibition of the photo-curing adhesive and secondary curing in the protective gas atmosphere, the precision and accuracy in the pattern fixing process can be effectively kept.

Description

technical field [0001] The invention relates to the field of gluing methods, in particular to a method for fixing patterns in a magnetic field. Background technique [0002] Surface patterning technology is of great significance to the development of modern science and technology. Micromachining or patterning of surface structures and properties on the micron and nanoscale has gradually become the center of contemporary science and technology. Many opportunities for modern technology development come from The successful construction of new microstructures or the miniaturization of existing structures, the rapidly developing microelectronics industry is a typical example. The current and potential applications of surface patterning technology drive the continuous development of patterning technology itself. In addition to common patterning technologies such as lithography, soft lithography, and inkjet printing, the self-assembly of micro-nano-sized particles in a magnetic fi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09J163/10C09J175/14C09J167/06C09J171/00C09J5/00
CPCC09J5/00C09J163/10C09J167/06C09J171/00C09J175/14
Inventor 朱晓群胡栋栋聂俊
Owner BEIJING UNIV OF CHEM TECH