Manufacturing method of transparent conductive film and structure thereof
A technology for a transparent conductive film and a manufacturing method, which is applied in the manufacture of cables/conductors, conductive layers on insulating carriers, circuits, etc., can solve the problems of decreased yield, increased cost, obvious etching marks, etc.
Active Publication Date: 2016-12-21
INTERFACE TECH CHENGDU CO LTD +2
View PDF5 Cites 1 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, the re-heated ITO thin film has problems such as inaccurate alignment, obvious etching marks, and cracks (cracks), resulting in a decrease in yield and an increase in cost, which still needs to be improved.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0022] In order to achieve the above-mentioned purpose and effect, the technical means and structure adopted in this creation are hereby drawn to illustrate in detail the characteristics and functions of the preferred embodiment of this creation as follows, so that Li can fully understand it, but it should be noted that these contents are not constituting the limitations of the invention.
[0023] Please also see figure 2 and image 3 As shown, it is a method flowchart and a schematic diagram of the manufacturing process of a preferred embodiment of the method for manufacturing the transparent conductive film of the present invention.
[0024] The manufacturing method of transparent conductive film comprises the following steps:
[0025] Step 91 : providing a substrate 1 , a conductive film material 2 , a screen printing film plate 5 and a metal conductive paste 4 . The substrate 1 is a substrate used in a common touch panel manufacturing process, which may be made of a re...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| angle | aaaaa | aaaaa |
| size | aaaaa | aaaaa |
| size | aaaaa | aaaaa |
Login to View More
Abstract
The invention discloses a manufacturing method of a transparent conductive film and a structure thereof. The manufacturing method of the transparent conductive film comprises the steps of: providing a substrate, a conductive film material, a metal print film plate and a metal conductive slurry, wherein the metal print film plate comprises an opening in a predetermined shape; arranging the conductive film material on the substrate; arranging the metal print film plate on the conductive film material; liquefying the metal conductive slurry, and placing the liquefied metal conductive slurry in the opening; removing the metal print template; baking the conductive film material and the metal conductive slurry to form a conductive film layer and a metal conductive layer; and patterning the conductive film layer which is not positioned on the metal conductive layer. By adopting the manufacturing method, one step of baking process can be reduced, so that a heat expansion and cold contraction amplitude of the size of the transparent conductive film is reduced, etching marks cannot be caused and the probability of crack occurrence cannot be reduced due to the influence of heat expansion and cold contraction of the substrate.
Description
technical field [0001] The present invention relates to a method for manufacturing a transparent conductive film and its structure, in particular to a method of reducing one-time baking process, so that the thermal expansion and contraction of the size of the transparent conductive film becomes smaller and will not be affected by the thermal expansion and contraction of the substrate. To produce etching marks and reduce the probability of cracks (Crack). Background technique [0002] The current touch panel electrodes mostly use indium tin oxide (ITO) transparent electrode sheets. Indium tin oxide (ITO) is a metal compound with good transparent and conductive properties. It has a band gap, high light transmittance in the visible spectrum, and resistivity Low characteristics, indium tin oxide (ITO) conductive glass is widely used in the fields of flat panel display devices, solar cells, special function window coatings and other optoelectronic devices, and is currently the mo...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14H01B1/02H01B13/00
CPCH01B1/02H01B5/14H01B13/00
Inventor 郭南村谢嘉铭林子祥
Owner INTERFACE TECH CHENGDU CO LTD