Contour etching method and device

Abstract

Embodiments of the invention disclose a contour etching method and device. In the method, a contour mask is computed according to the dimension parameters of contour segments, a contour mask algorithm and an aperture radius, wherein the contour mask has the same compensation etching amount at each contour segment, in this case, even if the etching amount obtained at a corner is identical to the etching amount obtained by other parts of the contour, so that if the corner in a to-be-etched pattern is a round fillet, the corner is still the round fillet after etching and cannot become a sharp corner. Furthermore, the method carries out pattern Boolean operation on each contour segment and the contour mask and combines the contour segments included in an overlapping region in the to-be-etched pattern subjected to etching compensation, so that the extra contour segments can be eliminated. Through the contour etching method disclosed by the embodiments of the invention, an etching result is the same as an excepted etching result, so that a problem that the etching result is different from the excepted etching result in the prior art is solved.

Description

technical field [0001] The embodiments of the present invention relate to the technical field of industrial manufacturing, and in particular to a method and device for etching a contour. Background technique [0002] Etching refers to a technique in which material is removed using a chemical reaction. At present, etching technology is usually used when making PCB circuit boards. [0003] When making PCB circuit boards according to etching technology, it is necessary to etch according to the design dimensions contained in the etching data. However, due to the etching process itself, there is often a problem of over-etching in the circuit board pattern, which leads to the size of the circuit board pattern not meeting the design size. For example, when etching the outer contour of a circuit board, over-etching will cause the actual outer contour size to be smaller than the designed size. In this case, the staff usually estimates the amount of over-etching based on previous e...

AI Technical Summary

Problems solved by technology

After using the existing technology for simulated etching, after the two line segments undergo etching compensation, the corresponding new contour segment is shifted by an empirical etching amount, and since the intersection point of the new contour segment is taken as the intersection point after etching, the actual etching result Sharp corners are formed between the new contour segments, and the expected etching result is a rounded corner, which is different from the expected etching result; (2) If there is an overlapping area between the two contours to be etched, after etching, the overlapping area often contain redundant etch profiles, resulting in actual etch results that differ from expected etch results

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