Conduction film of second face of electrochromism inside rear-view mirror and production method thereof
An electrochromic, interior rearview mirror technology, applied in optical components, optics, instruments, etc., can solve problems such as difficulty in meeting customer requirements and difficult to achieve specular reflection color
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Embodiment 1
[0020] The float glass is washed and dried.
[0021] Using silane and methane as reaction gases, plasma-enhanced chemical vapor deposition technology is used to deposit a 1100Å, Eu layer containing SiC nanoparticles on the surface of float glass 2 O 3 Nanoparticle layer 1000Å, ITO layer 1000Å; the specific preparation process parameters are:
[0022] RF power density: 700W / cm 2 , RF frequency: 12.55 MHz, deposition temperature: 280°C, deposition pressure: 120 Pa, hydrogen diluted 12% (volume percentage) silane flow rate: 40 sccm, methane (purity: 99.9995%) flow rate: 50 sccm.
[0023] Obtain the transflective and translucent ITO conductive glass with the required reflectivity of 45%.
Embodiment 2
[0025] The float glass is washed and dried.
[0026] Using silane and methane as reaction gases, plasma-enhanced chemical vapor deposition technology is used to deposit a layer of SiC nanoparticles containing 500Å, Eu on the surface of float glass 2 O 3 Nanoparticle layer 600Å; SiC nanoparticle layer 300Å, WO 3 Nanoparticle layer 800Å; ITO layer 1200Å; the specific preparation process parameters are:
[0027] Radio frequency power density: 400 W / cm 2 , RF frequency: 13.56 MHz, deposition temperature: 300 ℃, deposition pressure: 70 Pa, hydrogen diluted 10% (volume percentage) of silane flow rate: 30 sccm, methane (purity: 99.9995%) flow rate: 40 sccm. The semi-reflective and semi-transparent ITO conductive glass with the required reflectivity of 52.8% is obtained.
Embodiment 3
[0029] The float glass is washed and dried.
[0030] Using silane and methane as reaction gases, plasma-enhanced chemical vapor deposition technology is used to deposit a layer of SiC nanoparticles containing 200Å, Eu on the surface of float glass 2 O 3 Nanoparticle layer 350Å; SiC nanoparticle layer 300Å, WO 3 Nanoparticle layer 250Å; SiC nanoparticle layer 400Å, Eu 2 O 3 Nanoparticle layer 150Å; ITO layer 1600Å; the specific preparation process parameters are:
[0031] RF power density: 520 W / cm 2 , RF frequency: 13.56 MHz, deposition temperature: 280°C, deposition pressure: 80 Pa, hydrogen diluted 10% (volume percentage) silane flow rate: 50 sccm, methane (purity: 99.9995%) flow rate: 60 sccm.
[0032] The semi-reflective and semi-transparent ITO conductive glass with the required reflectivity of 55.1% is obtained.
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