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Mask scratch prevention system and exposure system

A mask and substrate technology, which is used in microlithography exposure equipment, photolithographic process exposure devices, optics, etc., to reduce repair costs and prevent foreign objects from being scratched.

Active Publication Date: 2017-01-25
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The object of the present invention is to provide an anti-mask plate scratching system and an exposure system to prevent foreign matter on the surface of the substrate from scratching the mask plate during the exposure process and reduce the repair cost of the mask plate

Method used

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  • Mask scratch prevention system and exposure system
  • Mask scratch prevention system and exposure system
  • Mask scratch prevention system and exposure system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] see figure 1 , figure 2 , Figure 7 and Figure 8 The anti-mask scratching system provided by the embodiment of the present invention includes: a scanning unit 1 and a detection unit 2 connected to the output end of the scanning unit 1;

[0043] The scanning unit 1 is used to scan the height of the foreign matter on the surface of the substrate in the exposure state;

[0044] The detection unit 2 is used to judge whether there is a foreign object with a height greater than a preset height on the surface of the substrate in the exposure state, if yes, stop exposing the substrate, if not, continue exposing the substrate; The height difference from the height to the height of the substrate 03.

[0045] Combine below Figure 7 and Figure 8 The working process of the anti-mask scratching system provided in this embodiment will be described in detail.

[0046] In the first step, the scanning unit 1 scans the height of the foreign matter on the surface of the substrat...

Embodiment 2

[0099] Please refer to Figure 1-Figure 2 An embodiment of the present invention also provides an exposure system, including the anti-mask scratch system provided in Embodiment 1, the anti-mask scratch system is arranged in a non-exposed area of ​​the base 01 of the exposure system.

[0100] Compared with the prior art, the exposure system provided by the embodiment of the present invention has the same beneficial effects as the mask scratch prevention system provided by the first embodiment above, and details are not repeated here.

[0101] In the description of the above embodiments, specific features, structures, materials or characteristics may be combined in any one or more embodiments or examples in an appropriate manner.

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PUM

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Abstract

The invention discloses a mask scratch prevention system and an exposure system, relates to the technical field of display, and aims at solving the problem that a mask is scratched by foreign matters on the surface of a substrate in an exposure process, and reducing the repairing cost of the mask. According to the mask scratch prevention system, a scanning unit is utilized to scan the heights of the foreign matters on the surface of the substrate in an exposure state; a detection unit is utilized to judge whether the foreign matters with the heights larger than a preset height exist on the surface of the substrate in the exposure state, exposing the substrate is stopped if on yes judgment, and the substrate is continuously exposed if on no judgment; the preset height is smaller than a height difference between the height of the mask and the height of the substrate. The exposure system comprises the mask scratch prevention system mentioned in the technical scheme. The mask scratch prevention system is used for exposing the substrate.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an anti-mask plate scratching system and an exposure system. Background technique [0002] In the process of manufacturing a display device, common display substrates are generally fabricated using an exposure process, and these display substrates may be array substrates, color filter substrates, or contact hole substrates. [0003] At present, the common color filter substrates and touch substrates are mainly made by proximity exposure technology; that is, the entire surface of the photoresist is coated on the substrate, and then the mask is placed on the substrate to ensure that the mask and the substrate There is a certain distance between them, and then the photoresist on the substrate is irradiated with ultraviolet light through the light-transmitting area of ​​the mask, so that the physical properties of the photoresist on the substrate are changed, thereby realizing the p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/7065G03F7/70916
Inventor 刘庭良曹中林冯远明周刚
Owner BOE TECH GRP CO LTD