Dynamically monitoring system for radio frequency power supply with integrated control panel

Abstract

The invention discloses a dynamically monitoring system for radio frequency power supply with integrated control panel. The system comprises a control chip integrated in the control panel, an interface circuit, a TFT display, a direct current / direct current converter, and a digital dial plate. The interface circuit is connected with the radio frequency power supply through a simulated user's interface. The control chip conducts real-time scanning and controls the interface circuit to obtain the running data of the radio frequency power supply and displays the result on the TFT display dynamically in a real-time manner. The digital dial plate is used for setting the output power of the radio frequency power supply. The control chip adopts an external interrupt triggering mode to scan the digital dial plate, to obtain the set output power and to control the power of the radio frequency power supply through the interface circuit. According to the invention, it is possible to monitor the working state of radio frequency equipment effectively in a real time manner so that equipment in fault can be spotted and replaced as early as possible. For the data display on the TFT display screen, the dynamic data of equipment running can be seen obviously. For the employment of the digital and adjustable pole difference, the output power can be controlled. The system can be easily operated and the cost of the system is also reduced.

Description

Technical field [0001] The invention relates to the field of radio frequency technology, in particular to a dynamic monitoring system for radio frequency power. Background technique [0002] In the past one or two decades, the microelectronics industry has developed rapidly. With the continuous progress of low-temperature plasma technology, plasma equipment with various functions such as radio frequency (or radio frequency magnetron) sputtering, plasma etching (PE), reaction Ion etching (RIE), plasma deposition (PECVD), etc., have also received increasing attention and have been widely used in many fields. First, the application of etching silicon nitride, polysilicon, aluminum, and depositing silicon nitride in the semiconductor industry. Following the development of other industries, this new technology is also actively used, such as the deposition of various optical films, sensitive films, minimally invasive medical treatment, surface modification of chemical fibers and organ...

AI Technical Summary

Problems solved by technology

This mode not only configures a large and expensive computer, but also brings great difficulties to the field application and actual operation of the equipment.

Images