Oxide film of porous structure and preparation method and application of oxide film
A technology of oxide film and porous structure, applied in the field of oxide film with porous structure and its preparation, can solve the problem of difficult to meet the high requirement of visible light transmittance, and achieve simple structure, high visible light transmittance and transparency Good results
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Embodiment 1
[0035] Such as Figure 1 to Figure 3 Shown, a kind of preparation method of the oxide thin film with porous structure, it comprises the following steps:
[0036] Step A, substrate pretreatment
[0037] A1, first wash the substrate (the substrate is made of architectural glass) and then dry it;
[0038] A2, reconfigure a toluene solution containing a silane-containing surfactant (the surfactant in this embodiment is octadecyltrichlorosilane), wherein the silane content is 0.5-5%;
[0039] A3, soak the substrate in the above toluene solution and let it stand for a period of time (the standing time is less than 2 hours), then take it out and wash it, and dry it at 120 degrees Celsius for 1-30 minutes (preferably the drying time is less than 10 minutes) , will be as figure 2 The hollow mask shown is placed on the substrate, irradiated with ultraviolet light (ultraviolet wavelength less than 254 nanometers) for a certain period of time (irradiation time less than 1 hour) to for...
Embodiment 2
[0047] Embodiment 2, embodiment 2 is basically the same as embodiment 1, the difference is that the substrate 1 adopts sapphire; the vanadium dioxide grains 2 are doped vanadium dioxide grains, and the doping ions are W, Mo , Ti, Mg, F in one or more.
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