Manufacturing method of light-emitting diode
A technology of light-emitting diodes and manufacturing methods, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of easy damage and low appearance yield of Micro LED, and achieve the effect of improving the appearance yield
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2017-02-22
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Abstract
Description
technical field
[0001] The invention relates to the technical field of optoelectronic manufacturing, in particular to a method for manufacturing a light emitting diode. Background technique
[0002] LED (Light Emitting Diode, Light Emitting Diode) has the advantages of small size, long life, low power consumption, etc., and is currently widely used in automobile signal lights, traffic signal lights, display screens and lighting equipment.
[0003] In the production process of Micro LED (Micro Light Emitting Diode, miniature light-emitting diode), an epitaxial layer is first formed on the growth substrate, and then a V-shaped groove extending to the growth substrate is formed on the epitaxial layer. The epitaxial layer is divided into several mutually The epitaxial sublayer is independent, and then the epitaxial sublayer is bonded to the transfer substrate, and the growth substrate is removed for subsequent processing.
[0004] In the process of realizing the present inventi...
Examples
Embodiment Construction
[0040] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0041] The embodiment of the present invention provides a method for manufacturing a light emitting diode, figure 1 It is a flowchart of a method for manufacturing a light-emitting diode provided by an embodiment of the present invention, such as figure 1 As shown, the method includes:
[0042] S11: sequentially forming an epitaxial layer and a protective layer on the growth substrate.
[0043] S12: Forming a plurality of grooves extending to the substrate on the protection layer, the plurality of grooves dividing the epitaxial layer into a plurality of independent epitaxial sub-layers.
[0044] S13: Under the protection of the protective layer, the epitaxial sublayer is etched through the groove, so that the angle between the side s...