Apparatus for fabricating variable period photonic crystals based on multi-beam interferometry

Abstract

The invention relates to a device for manufacturing a period-variable photonic crystal on the basis of multiple beam interferometry, and relates to photonic crystals. A laser device, a spatial filter, a diaphragm, a convex lens, a multi-beam generation component and a photoresist plate are arranged successively; a light outlet of the spatial filter is arranged in a focus of the convex lens; after the spatial filter carries out beam expanding on laser emitted by the laser device, the laser is changed into a beam of diverging light, the diverging light is changed into a beam of parallel light when passing the convex lens, the beam of parallel light irradiates on the multi-beam generation component along the normal direction, the multi-beam generation component adjusts an optical path of the beam of parallel light to generate multiple coherent light beams, the multiple coherent light beams are overlapped on the photoresist plate, single exposure is carried out on an overlapped interference area of the multiple beams on the photoresist plate, and the period-variable photonic crystal is obtained via development.

Description

technical field [0001] The invention relates to photonic crystals, in particular to a device for manufacturing variable-period photonic crystals based on a multi-beam interference method. Background technique [0002] The precision of laser interference lithography is very high, reaching the micro-nano level. Properly adjusting the angle between the interfering light can even make the period of the micro-nano structure close to half of the laser wavelength. It is a highly operable method. Micro-nano structure preparation technology. [0003] Multi-beam interferometry is commonly used to fabricate photonic crystals. The three-dimensional optical structure can be recorded very conveniently by using the photosensitive properties of the photoresist and the single exposure method. Then through the development process, the prepared structure can be revealed, so as to obtain the desired photonic crystal. [0004] It is well known that the periodic electric potential field genera...

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Problems solved by technology

[0006] The purpose of the present invention is to provide a multi-beam based multi-beam interference lithography system with simple structure, strong operability and large-area variable period for the shortcomings of the existing multi-beam interference lithography system, such as complex optical path and difficult adjustment of beam incident angle. Device for manufacturing variable-period photonic crystals by interferometry

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