Novel developing unit
A developing unit, a new type of technology, applied in photography, patterned photoplate making process, optics, etc., can solve the problems of time-consuming and laborious cleaning, many wheel marks, and OC photoresist is easy to be washed off, so as to avoid manpower and time consumption, reducing the effect of wheel printing
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Embodiment 1
[0026] Such as Figure 3 to Figure 5 As shown, a new type of developing unit provided in this embodiment includes a developing section 1 and a water washing section 4. The developing section 1 contains developing chambers 11 (shown as 11a-11d), and the upper layers of each developing chamber 11 are combined into a middle layer The process part 13 and the lower layer are combined into the bottom pipeline part 12 . Water pump 14 (shown as 14a, 14b), solenoid valve 20 (shown as 20a, 20b). The water tank 18 and the pump 14b are located in the second developing chamber 11c, the developer liquid storage tank 15 and the pump 14a are located in the first developing chamber 11d, the pump 14a and the first electromagnetic valve 20b are located in the developer liquid storage tank pipeline 21, the pump 14b and The second electromagnetic valve 20a is located in the water tank pipeline 19, the water tank 18 is connected with the developing spraying device 16 through the connecting pipelin...
Embodiment 2
[0030] The general structure in this embodiment is the same as that in Embodiment 1, and the same parts will not be described again.
[0031] When in the protective layer process, before the color filter glass substrate enters the developing chamber, the second electromagnetic valve 20a is operated through the touch screen to open the water tank 18, and the first electromagnetic valve 20b is closed to allow the developer to store liquid. Case 15 is closed, and water provides power by pump 14b, and the developing solution remaining in the developing chamber is cleaned by developing spray device 16, and the preferred cleaning time is 15 minutes, to wash away the remaining developing solution in the developing chamber as far as possible, to avoid Residual developer has an impact on OC photoresists, reducing the amount of manpower and time required for cleaning. Then, let the color filter glass substrate pass through the developing chamber and continue to pass through the treatmen...
Embodiment 3
[0033] In this example, the figure 1 , figure 2 The high-altitude conveyor 2 and the lifting mechanism 3 arranged in the developing section 1 and the washing section 4 in the prior art shown reduce the cost of the machine, and simultaneously save the need for the color filter glass substrate to rise and fall via the lifting mechanism 3 Time increases the tempo of the entire process.
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