A kind of medical titanium-based metal material and its manufacturing method
A metal-based, medical technology, which is applied in the field of manganese-doped medical titanium metal materials and its manufacturing, can solve the problems of insufficient antibacterial and osteogenic healing performance, and achieve improved antibacterial and osteogenic performance, good antibacterial performance, and stable preparation process controllable effect
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Embodiment 1
[0042] After a 10mm×10mm×1mm pure titanium sheet was ultrasonically treated twice (5 minutes each time) with mixed acid (hydrofluoric acid: nitric acid: deionized water = 1:5:34), it was washed with acetone, ethanol and deionized water in sequence. Ultrasonic cleaning was performed twice for 5 minutes each time. Using plasma immersion ion implantation technology, the manganese element is implanted into the titanium substrate. The specific process parameters are shown in Table 1:
[0043] Table 1 Manganese ion implantation parameters
[0044] Injection voltage (kV)
30
Pulse width (μs)
500
Injection time (h)
1h
Background vacuum (Pa)
5×10 -3
Frequency (Hz)
5
[0045] figure 1 It is a comparison diagram of the scanning electron microscope morphology of the titanium metal material obtained through the modification treatment of this embodiment and the pure titanium surface. In the figure: a / c is pure titanium, and b / d is...
Embodiment 2
[0048] After a 10mm×10mm×1mm pure titanium sheet was ultrasonically treated twice (5 minutes each time) with mixed acid (hydrofluoric acid: nitric acid: deionized water = 1:5:34), it was washed with acetone, ethanol and deionized water in sequence. Ultrasonic cleaning was performed twice for 5 minutes each time. Using plasma immersion ion implantation technology, the manganese element is implanted into the titanium substrate. The specific process parameters are shown in Table 2:
[0049] Table 2 Manganese ion implantation parameters
[0050] Injection voltage (kV)
30
Pulse width (μs)
800
Injection time (h)
1h
Background vacuum (Pa)
5×10 -3
Frequency (Hz)
5
[0051] image 3 It is the manganese element XPS depth distribution diagram of the manganese doped modified layer obtained through the modification treatment of this embodiment. Depend on image 3 It can be seen that the manganese ion implantation depth of the ...
Embodiment 3
[0055] After a 10mm×10mm×1mm pure titanium sheet was ultrasonically treated twice (5 minutes each time) with mixed acid (hydrofluoric acid: nitric acid: deionized water = 1:5:34), it was washed with acetone, ethanol and deionized water in sequence. Ultrasonic cleaning was performed twice for 5 minutes each time. Using plasma immersion ion implantation technology, the manganese element is implanted into the titanium substrate. The specific process parameters are shown in Table 3:
[0056] Table 3 Manganese ion implantation parameters
[0057] Injection voltage (kV)
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