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Method for forming test patterns

A technology for testing graphics and graphics, which is applied to the photo-engraving process of the pattern surface, the originals and instruments for opto-mechanical processing, etc., which can solve the problem that the product yield needs to be improved, and achieve a rich variety and quantity with high yield. Effect

Active Publication Date: 2017-05-24
SEMICON MFG INT (SHANGHAI) CORP +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the yield rate of products manufactured by dual patterning technology in the prior art still needs to be improved

Method used

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  • Method for forming test patterns
  • Method for forming test patterns

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Embodiment Construction

[0022] As mentioned in the background art, the yield rate of the products manufactured by adopting the dual patterning technology in the prior art still needs to be improved.

[0023] After research, it is found that when the prior art performs various inspections on the first design pattern and the second design pattern obtained by dismantling, it is actually compared with the test pattern in the test pattern library (library), that is to say, the test The type and quantity of test patterns in the pattern library will affect the detection results. For example, the test patterns in the test pattern library have fewer types or fewer quantities. In fact, the first design graphic and the second design graphic may not be the optimal dismantling graphic, and when the gap between the first design graphic and the second design graphic and the optimal dismantling graphic is large, it will seriously affect the manufacturing process. product yield.

[0024] Further study provides a me...

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Abstract

A method for forming test patterns is provided; original test patterns in an original test pattern library are subjected to a series of transformation, and finally, a first test pattern and a second test pattern are obtained; the first test pattern and the second test pattern are added to the original test pattern library, and a new test pattern library is formed. In addition to comprising a plurality of original test patterns, the new test pattern library also comprises the first test pattern and the second test pattern, so the types and number of the test patterns in the new test pattern library are greatly enriched. Therefore, when original design patterns provided by customers are disassembled and detected subsequently, a best and most accurate first design pattern and second design pattern can be obtained, so as to help to form a higher-yield product subsequently.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method for forming test patterns. Background technique [0002] Semiconductor technology continues to move towards smaller process nodes driven by Moore's Law. With the continuous advancement of semiconductor technology, the functions of devices are becoming more and more powerful, and the difficulty of semiconductor manufacturing is also increasing day by day. Photolithography technology is the most critical production technology in the semiconductor manufacturing process. As the semiconductor process node becomes lower and lower, the minimum line width and spacing designed in semiconductor technology continue to shrink. When the characteristic size of the exposure line is close to the theoretical resolution of the exposure system When the rate limit is reached, the imaging on the surface of the semiconductor substrate will produce serious distortion, whic...

Claims

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Application Information

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IPC IPC(8): G03F1/44G03F1/36
Inventor 杨青
Owner SEMICON MFG INT (SHANGHAI) CORP
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