Mask holder cleaning device and exposure machine

A technology for cleaning devices and masks, which is applied to microlithography exposure equipment, photolithography exposure devices, and optical mechanical equipment. It can solve the problems of low cleaning efficiency and insufficient cleaning degree, and achieve the goals of improving efficiency and quality assurance. Effect

Active Publication Date: 2020-06-05
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a photomask clip cleaning device and an exposure machine, which are used to solve the technical problems of low cleaning efficiency and insufficient cleaning degree existing in the prior art

Method used

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  • Mask holder cleaning device and exposure machine
  • Mask holder cleaning device and exposure machine
  • Mask holder cleaning device and exposure machine

Examples

Experimental program
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Embodiment Construction

[0037] The present invention will be further described below in conjunction with accompanying drawing.

[0038] Such as figure 1 As shown, the present invention provides a photomask holder cleaning device, which includes an adsorption part 1, the adsorption part 1 is fixed at the opening of the photomask exchange chamber 21, the photomask exchange chamber 21 is used to accommodate the photomask holder 3, The suction surface of the suction component 1 is set facing the surface of the photomask holder 3 .

[0039] Specifically, the mask exchange chamber 21 is disposed inside the exposure machine 2 . The reticle exchange chamber 21 is provided with an opening for the reticle holder 3 to enter or exit, and the adsorption component 1 is located at the opening. Movement, during the movement, the adsorption part 1 will suck away the foreign matter on the photomask holder 3; when performing the operation on the machine, the photomask holder 3 moves from the outside of the photomask ...

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PUM

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Abstract

The invention relates to a photomask card holder cleaning device and an exposure machine, relates to the technical field of liquid crystal display devices and is used for solving the technical problems that the cleaning efficiency is low and the cleaning degree is not high in the prior art. The photomask card holder cleaning device comprises an adsorption part, wherein the adsorption part is fixed to the exposure machine and is used for containing a photomask exchange cavity of a photomask card holder. When a machine loading or unloading action is performed, the adsorption part can quickly absorb foreign matters on the photomask card holder, so that cleaning efficiency can be improved by the adsorption part; furthermore, for the process that the photomask card holder moves from an opening of the photomask exchange cavity to completely enter the photomask exchange cavity, with the movement of the photomask card holder, the adsorption part performs scanning adsorption, so that the photomask card holder can be thoroughly cleaned, and the quality of a product is guaranteed.

Description

technical field [0001] The invention relates to the technical field of liquid crystal displays, in particular to a photomask clamp cleaning device and an exposure machine. Background technique [0002] At present, in the exposure (Photo) process of the thin film transistor liquid crystal display (TFT-LCD) industry, it is necessary to use an exposure machine to define circuit graphics through a mask. The mask of the machine is loaded and unloaded (about 1 day / time), that is, the mask that is not in use is loaded from the machine (Load) and put into a special box for sealing, and then the mask that needs to be used Take it out of the mask box, place it in the mask holder, and then load it into the machine. [0003] When the photomask is going on and off the machine, the photomask is placed in the photomask clip and enters the machine, and the clip will inevitably carry some foreign objects (Partcile), and these foreign objects will enter the machine with the photomask clip I...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/82G03F7/20
CPCG03F1/82G03F7/707G03F7/70925
Inventor 罗善高
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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