Checking method for optical proximity effect correction consistency of layout repetitive units

Abstract

The invention provides a checking method for optical proximity effect correction consistency of layout repetitive units. According to the method, first, a graphic library containing original design layers corresponding to all datum graphs and layers obtained after the original design layers are corrected by the optical proximity effect is established; second, xor operation is performed on the original design layers corresponding to all the datum graphs in the graphic library, the layer obtained after the original design layer corresponding to the datum graph which is completely and successfully matched with each region of original design of a layout is corrected by the optical proximity effect and the layers obtained after the original design layers corresponding to all the datum graphs in the graphic library are corrected by the optical proximity effect, and differences and corresponding difference values are obtained; and last, the differences with the difference values greater than an acceptable difference value are classified to reduce difference types. In this way, ten millions of differences can be reduced into several or tens of differences, and the accuracy and efficiency of correction consistency checking work in a repetitive region of layout design correction work are greatly improved.

Description

technical field [0001] The invention relates to the field of graphic design for manufacturability, in particular to a consistency check method for optical proximity effect correction of layout repeating units. Background technique [0002] Generally speaking, the design data in the layout design of an integrated circuit contains highly repetitive designs, such as the storage area of ​​a logic chip and the photosensitive area of ​​a camera chip. In order to ensure that the signals in the integrated circuit can be kept consistent, it is necessary to require that the layout data of all the graphics can still maintain a high degree of uniformity after each optical proximity effect processing. [0003] Errors in the design itself or the optical proximity effect correction software are likely to cause inconsistent correction results of repeated graphics. With the continuous advancement of the process nodes of integrated circuits, the correction difference of repeated patterns has...

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Problems solved by technology

The current inspection work is mainly through simple inspection by engineers, but it is difficult for engineers to determine whether tens of millions o

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