Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Fine mask plate supporting frame, fine mask plate and preparation method thereof

A technology of fine mask plate and support frame, which is applied in the direction of vacuum evaporation plating, coating, electric solid device, etc., can solve the problems of low precision of film layer, fluctuation of extrusion force, different position precision of effective opening area, etc., to achieve Effects of improving mask accuracy and improving positional accuracy

Active Publication Date: 2019-02-26
BOE TECH GRP CO LTD +1
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The welding of the current shielding strips and support strips is completed before the welding of the mask strips, and there is no need to use extrusion force on the mask frame when welding them, but when welding the mask strips, it is necessary to use external force to make the mask The opening 05 on the strip reaches a suitable precision, and correspondingly, the extrusion force needs to be used to act on the mask frame, so that the mask strip can still receive the same tension as before welding after welding (the tension is the recovery deformation of the mask frame The force generated by the mask strip welded on it) to ensure that the effective opening area of ​​the mask strip remains unchanged before and after welding, but the extrusion force set on the mask frame in actual production is always at If the fluctuation is too large or too small, the position accuracy of the effective opening area before welding and after welding is different. The effective opening area after welding sometimes shrinks inward (extrusion force is set too small), and sometimes expands outward ( Extrusion force set too high)
At the same time, as the fine mask is used for a longer period of time, the mask strips that have been welded and formed become looser, and the effective opening area of ​​the fine mask is deformed more, resulting in lower precision of the film layer formed by the fine mask.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fine mask plate supporting frame, fine mask plate and preparation method thereof
  • Fine mask plate supporting frame, fine mask plate and preparation method thereof
  • Fine mask plate supporting frame, fine mask plate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of patent protection of the present invention.

[0047] Such as figure 2 As shown, the embodiment of the present invention provides a fine mask support frame, including: a plurality of frames 11, a plurality of frames 11 enclosing the mask area 12, at least one pair of two frames 11 opposite to each other is provided with adjustment The openings 13 are provided with at least one adjusting member 14 on each adjusting opening 13 , and the adjusting member 14 is used to adjust the shape of the corres...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of display preparation, and discloses a support frame of a fine mask, a fine mask and a preparation method thereof, which are used to improve the positional accuracy of an opening area of ​​the mask, thereby improving mask precision. The supporting frame of the fine mask plate includes: a plurality of frames, the plurality of frames enclose the mask area, at least one pair of two frames facing each other is provided with adjustment openings, and each of the adjustment openings is provided with at least An adjustment member, the adjustment member is used to adjust the shape of the corresponding adjustment opening to adjust the deformation of the mask area.

Description

technical field [0001] The invention relates to the technical field of display preparation, in particular to a fine mask support frame, a fine mask and a preparation method thereof. Background technique [0002] At present, OLED (Organic Light-Emitting Diode, Organic Light-Emitting Diode) adopts a vacuum evaporation technology to prepare an organic light-emitting layer. In the device manufacturing process, organic materials are deposited on the substrate above the evaporation source by high-temperature evaporation. In order to evaporate the organic materials to a specific position according to the design, a high-precision metal mask is required under the substrate. A pre-designed effective opening area is left on the membrane plate (that is, a high-precision metal mask plate), and organic materials are deposited on the back plate through the effective opening area to form a preset pattern. Changes in the size and position of the effective opening area on the metal mask will...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24H10K99/00
CPCC23C14/042C23C14/24H10K71/166H10K71/00H10K99/00
Inventor 林治明李宝军张健孙朴黄俊杰
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products