Three-dimensional microstructure inscribing system and method based on continuous laser

Abstract

The invention discloses a three-dimensional microstructure inscribing system and method based on continuous laser. The three-dimensional microstructure inscribing system based on continuous laser comprises a continuous laser device, an acoustic-optical modulator, an objective lens, a photosensitive material and a three-dimensional nano displacement platform, wherein the continuous laser device is used for emitting laser light; the acoustic-optical modulator is used for adjusting the power of the laser light; the objective lens is used for focusing the laser light with the power being adjusted through the acoustic-optical modulator, so that a focused light beam is obtained, and the power density of the focused light beam is larger than the threshold power density obtained through two-photon absorption; the photosensitive material is subjected to two-photon polymerization under the effect of the focused light beam so as to be solidified, and thus two-photon polymerization direct-writing is achieved; and the three-dimensional nano displacement platform is used for carrying the photosensitive material and controlling the photosensitive material to move in the three-dimensional direction, and thus three-dimensional microstructure inscribing of the photosensitive material is achieved through layer-by-layer two-photon polymerization direct-writing of the photosensitive material. According to the three-dimensional microstructure inscribing system and method based on continuous laser, the low-cost laser continuous laser device is used as an inscribing light source, the power of the inscribing light source is adjusted through the acoustic-optical modulator, three-dimensional microstructure inscribing of the continuous laser device is achieved, and cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing, and more specifically relates to a continuous laser-based three-dimensional microstructure writing system and method. Background technique [0002] Two-photon polymerization laser direct writing technology is a technology that converges laser beams into extremely small light spots and then exposes photosensitive materials to directly generate micro-nano structures. The basic principles are two-photon absorption effect and two-photon polymerization effect. The two-photon absorption effect is a nonlinear effect with extremely strong threshold selectivity, and can "directly write" a three-dimensional structure that breaks through the optical diffraction limit. Since two-photon absorption requires strong optical excitation, expensive femtosecond lasers with near-infrared wavelengths are often used as writing light sources. [0003] To sum up, the existing 3D microstructure writing requ...

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Problems solved by technology

[0004] In view of the defects of the prior art, the purpose of the present invention is to solve the technical problem that femtosecond laser is needed to realize strong light excitation and high cost for three-dimensional microstructure writing

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