A Surface Plasmon Optical Switch Based on Periodic Subwavelength Hole Array
A surface plasmon and optical switch technology, applied in the direction of nonlinear optics, optics, optical components, etc., can solve the problems of complex structure of surface plasmon optical switch, interference of pumping light, etc., and achieve simple structure, convenient operation, and small size Effect
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Embodiment 1
[0047] The material of the dielectric substrate 1 is quartz, with a thickness of 225nm; the material of the metal thin film 2 is silver, with a thickness of 50nm. The shape of the hole array is square, and the array period Px=Pz=600nm. The pore size D of a single pore 3 is 354 nm, the angle θ of the tip is 53°, and the length L of the base of the tip is 70 nm. The bottom length of the tip is the distance between the intersection point of the tip (first outer tip 31, second outer tip 32, first inner tip 33, second inner tip 34) and the circumference, image 3 is the spatial distribution diagram of the electric field z component Ez in the (x, z) plane at the silver / quartz interface of the open state cell structure in this embodiment. Since the polarization direction of the incident light is along the z axis, the first outer tip 31 and the second outer tip 32 are distributed perpendicular to the polarization direction of the incident light, and the first inner tip 33 and the sec...
Embodiment 2
[0049] The present invention can be effectively regulated by changing the material type, material thickness, array shape, array period, and the structural parameters of the hole 3 (aperture size, tip angle, tip bottom length) and other parameters of the surface plasmon optical switch based on the periodic hole array. The performance of the optical switch satisfies the use requirements in different environments.
[0050] Embodiment 2 shows a surface plasmon optical switch based on a periodic subwavelength hole array that can be used in an optical communication environment. The material of the dielectric substrate 1 is quartz, with a thickness of 225nm; the material of the metal thin film 2 is silver, with a thickness of 50nm. The shape of the hole array is square, and the array period Px=Pz=600nm. The pore size D of a single hole 3 is 354 nm, the angle θ of the tip is 53°, and the length L of the base of the tip is 110 nm. Image 6 is the transmittance spectrum in Example 2, ...
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