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Material performance testing device and manufacturing method

A technology for testing device and material properties, applied in measurement devices, analysis materials, material excitation analysis, etc., can solve problems such as poor adhesion, unsatisfactory color filter insulating layer pattern, etc., achieve strong adhesion, ensure test results, Uniform effect of organic photoresist film

Active Publication Date: 2017-09-08
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Based on the problem that the existing material detection device has poor adhesion of the organic photoresist material on the metal, resulting in an unsatisfactory color filter and / or insulating layer pattern after exposure and development, the present invention provides a material performance testing device and its production method

Method used

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  • Material performance testing device and manufacturing method
  • Material performance testing device and manufacturing method

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Embodiment Construction

[0025] The material performance testing device and the manufacturing method of the device will be explained in detail below in conjunction with the accompanying drawings.

[0026] see figure 1 , figure 1 It is a schematic structural diagram of an embodiment of a material property testing device of the present invention, the material property testing device includes a substrate 100, a metal grid 200 disposed on one side of the substrate 100, and an auxiliary gate 200 formed on the side of the metal grid 200 facing away from the substrate 100. Layer 300, and the functional layer 400 formed on the side of the substrate 100 with the metal gate 200 by exposure and development.

[0027] Specifically, the metal gate 200 is located between the substrate 100 and the auxiliary layer 300, and the metal gate 200 is used for electrical connection with other components. The functional layer 400 is made of organic photoresist material, which is used to match the performance of the light-em...

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Abstract

The invention discloses a material performance testing device. The device comprises a base plate, a metal gate, an auxiliary layer, and a functional layer, wherein the auxiliary layer is arranged on the metal gate; the metal gate is positioned between the base plate and the auxiliary layer; the functional layer is arranged on the base plate, and in a formation process of the functional layer, organic photoresist is adhered to the auxiliary layer for at least a period of time, and the functional layer coordinates with a light emitting device so as to detect the material performance. The invention also provides a manufacturing method of the material performance testing device. By the ways, organic photoresist films precipitated on the auxiliary layer are uniform, so that the desired functional layer can be obtained after exposure and development, and a test effect of the material performance testing device can be further ensured.

Description

technical field [0001] The invention relates to the technical field of material performance testing, in particular to a material performance testing device and a manufacturing method. Background technique [0002] LED (Light-Emitting Diode, light-emitting diode) has been widely used in all walks of life. With the development and progress of technology, OLED (Organic Light-Emitting Diode, organic light-emitting diode) and WOLED (White Organic Light-Emitting Diode, White light organic light-emitting diode), currently LED, OLED and WOLED have been widely used in various industries, including as indicator lights or applied to desk lamps, televisions, display panels, monitors, etc., so the luminous effect of LEDs is particularly important. [0003] LED, OLED and WOLED need to use a pixel definition material in the production process, the performance of the material is directly related to the luminous effect of the final product LED, OLED and WOLED, especially the oxygen content a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/17
CPCG01N21/17G01N21/6489G01N21/66H10K71/70G01N21/255G01N2201/0621H10K59/38H10K59/123H10K59/122H10K71/233H10K71/00
Inventor 李松杉
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD