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Method of preparing titanium oxide film by adopting sedimentation

A technology of titanium oxide thin film and deposition method, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of reducing experimental conditions and energy consumption, poor adhesion, easy to fall off, etc. Effects of conditions and energy consumption, easy control of parameters, and excellent wide-bandgap performance

Inactive Publication Date: 2017-10-13
SUZHOU NANER MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The invention provides a method for preparing a titanium oxide film by a deposition method. The invention effectively solves the key problems of poor matching between the oxide transparent conductive film and the flexible polyester substrate, poor adhesion, and easy shedding. The invention adopts atomic layer deposition method, based on TiO 2 Its own excellent wide bandgap performance, using chromium tris(ethylmethylamino)tert-butyramide which can be vaporized at a lower temperature as the chromium precursor source, effectively reduces the experimental conditions and energy consumption, and the atomic layer Deposition process parameters are easy to control

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Put the flexible polyester substrate into deionized water containing a certain amount of detergent, and ultrasonicate it in deionized water for 10 minutes; then, use a soft and clean brush to scrub the front and back of the flexible polyester substrate one by one to remove the dirt and dirt on the surface of the substrate. Oil stains, after that, rinse the substrate repeatedly with deionized water until the substrate is free of foam; then, put the flexible polyester in ethanol for 10 minutes to sonicate to remove organic matter on the surface of the substrate, and then rinse the substrate with deionized water repeatedly 4 times; Next, the flexible polyester base is subjected to deionized water ultrasonication for 25mins, and then the deionized water in the container is poured out, and new deionized water is added; finally, the clean flexible polyester is taken out of the deionized water one by one Spread them on a clean large petri dish, put them into a clean oven with a...

Embodiment 2

[0030] Put the flexible polyester base into deionized water containing a certain amount of detergent, and ultrasonically in the deionized water for 15 minutes; then, use a soft and clean brush to scrub the front and back of the flexible polyester base one by one to remove the dirt and dirt on the surface of the base. Oil stains, after that, rinse the substrate repeatedly with deionized water until the substrate is free of foam; then, put the flexible polyester in ethanol for 15 minutes to sonicate to remove organic matter on the surface of the substrate, and then rinse the substrate with deionized water repeatedly 6 times; Next, ultrasonicate the flexible polyester base with deionized water for 30mins, then pour out the ultrasonicated deionized water in the container, and add new deionized water; finally, take out the clean flexible polyester from the deionized water one by one Spread them on a clean large petri dish, put them into a clean oven with a temperature of 60°C and ba...

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PUM

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Abstract

The invention discloses a method of preparing a titanium oxide film by adopting sedimentation. The method effectively solves the key problems that the matching performance of a transparent oxide conductive film to a flexible polyester base is not good, the adhesiveness is poor, and the probability of falling is high. By adopting atom layer sedimentation, based on excellent wide bandgap performance of TiO2, tris(ethyl methylamino) butanamide chromium capable of being gasified at a low temperature is taken as a chromium precursor source, so that experiment conditions and energy consumption are reduced effectively, and atomic layer deposition process parameters are easy to control.

Description

technical field [0001] The invention relates to the field of conductive materials, in particular to a method for preparing a titanium oxide film by a deposition method. Background technique [0002] Transparent conductive film is a basic optoelectronic material with both high conductivity and high transparency in the visible light band. It is widely used in optoelectronic display fields such as displays, light-emitting devices, solar cells, sensors, and flexible touch screens, and has broad commercial application prospects. [0003] Dye-sensitized solar cells consist of four parts: photoanode, dye, electrolyte and counter electrode. Wherein, the substrate materials of the photoanode and the counter electrode are both transparent conductive glass. Currently, commonly used transparent conductive layers are mainly indium tin oxide (ITO) and fluorine-doped tin oxide (FTO). FTO is the earliest transparent conductive film to achieve industrial production. The preparation process...

Claims

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Application Information

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IPC IPC(8): C23C16/40C23C16/455C23C16/02
CPCC23C16/405C23C16/0227C23C16/0263C23C16/45525
Inventor 不公告发明人
Owner SUZHOU NANER MATERIAL TECH CO LTD
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