Porous gold-silver alloy nanomaterial as well as preparation method and application thereof
A technology of nanomaterials and silver alloys, applied in metal material coating technology, nanotechnology, nanotechnology, etc., can solve the problems of high preparation cost, complicated preparation method, hindering the adsorption of target molecules, etc., and achieve low preparation cost and high preparation method Effect of Simple, Excellent Surface Enhanced Raman Scattering Properties
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[0033] Specifically, the preparation method of the porous gold-silver alloy nanomaterial may include the following steps:
[0034]Step A, using a single-layer colloidal microsphere array with a colloidal microsphere diameter of 350-750 nm as a template, and depositing a layer of gold film on the surface of the template by a physical deposition method, and then removing the single-layer colloidal microsphere array by heat treatment, An ordered array of gold nanospheres was thus prepared.
[0035] Further: the specific implementation process of step A may include the following steps:
[0036] (1) Step A1, put the substrate into ethanol and deionized water in turn for ultrasonic cleaning, each liquid is ultrasonically cleaned for 20-60 minutes, and then the cleaned substrate is dried (for example, it can be placed in an oven to drying at 60°C for 20 minutes), and then placed in an ultraviolet ozone cleaning machine for 20-60 minutes of irradiation to obtain a substrate with a hy...
Embodiment 1
[0054] Such as Figure 10 Shown, a kind of porous gold-silver alloy nano material, its preparation method comprises the following steps:
[0055] Step a. Place the two substrates of glass slide and silicon wafer into acetone, ethanol, and deionized water in turn for ultrasonic cleaning. Ultrasonic cleaning is performed in each liquid for 20-60 minutes, and then the cleaned glass slide and silicon wafer Dry in an oven at 60°C for 20 minutes, and then place the dried glass slides and silicon wafers in an ultraviolet ozone cleaner for 20-60 minutes of irradiation to obtain glass slide substrates and silicon wafer substrates with hydrophilic surfaces.
[0056] Step b. Take 40mL of polystyrene colloidal microsphere suspension (2.5wt.%) with a colloidal microsphere diameter of 350-750nm, and mix it with an equal volume of ethanol, and then perform ultrasonic dispersion for 10-30min to obtain a dispersed Uniform colloidal microsphere diameter of 350 ~ 750nm polystyrene colloidal mic...
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