Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Two-degree-of-freedom parallel mechanism

A degree of freedom and parallel technology, applied in the direction of manipulators, program-controlled manipulators, manufacturing tools, etc., can solve the problems of narrow working space and poor adaptability, and achieve the effects of strong adaptability, convenient manufacturing and simple manufacturing

Inactive Publication Date: 2017-12-01
SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI
View PDF10 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing two-degree-of-freedom parallel mechanisms often have problems such as narrow working space and poor adaptability.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Two-degree-of-freedom parallel mechanism
  • Two-degree-of-freedom parallel mechanism
  • Two-degree-of-freedom parallel mechanism

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0025] Such as Figure 1-3 As shown, a two-degree-of-freedom parallel mechanism provided by the present invention includes a base 1, a driving mechanism, an upper platform 6, a lower platform 9 and a kinematic chain, wherein the base 1 is provided with a lower platform 9 and two groups of driving mechanisms, and the upper platform 6 is arranged above the lower platform 9 and is connected by multiple sets of kinematic chains. The two sets of driving mechanisms are respectively connected with the two sets of kinematic chains. The upper platform 6 can perform pitching or yaw motion through the driving of the two sets of driving mechanisms.

[0026] The kinematic chain includes a swing link 8 and two L-shaped swing links 7, the two L-shaped swing link...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a moving mechanism, in particular to a two-degree-of-freedom parallel mechanism. The two-degree-of-freedom parallel mechanism comprises a base, drive mechanisms, an upper platform, a lower platform and kinematic chains. The lower platform and the two drive mechanisms are arranged on the base. The upper platform is arranged above the lower platform and is connected with the lower platform through the multiple kinematic chains. The two drive mechanisms are correspondingly connected with the two kinematic chains. Each kinematic chain comprises a swing rod joint and two L-shaped swing rods. Every two L-shaped swing rods are correspondingly located on the two opposite sides of the upper platform or the lower platform. One ends of every two L-shaped swing rods are correspondingly and rotationally connected with the upper platform and the lower platform through rotary shafts, and the other ends of every two L-shaped swing rods are connected with the corresponding swing rod joint. The upper platform is driven by the two drive mechanisms to do pitching or yawing motion. The two-degree-of-freedom parallel mechanism has the flexible rotating capacity, is of a compact structure, is suitable for various application occasions and can reach the normal direction of any point of the whole hemispherical surface.

Description

technical field [0001] The invention relates to a motion mechanism, in particular to a two-degree-of-freedom parallel mechanism. Background technique [0002] A parallel mechanism is a multi-loop, multi-degree-of-freedom mechanism. Compared with the series mechanism, the structure of the parallel mechanism is more compact and has greater rigidity; the movement is flexible and fast, the load capacity is strong and it has better dynamic characteristics; because the parallel mechanism is a closed-loop structure, its motion has higher reliability. Due to the above-mentioned advantages of the parallel mechanism, the parallel mechanism is widely used in many fields such as machine tool processing, product sorting on the production line, and flight simulator, and has achieved good results. According to the data, the three-degree-of-freedom and six-degree-of-freedom mechanisms account for 80% of the publicly available parallel mechanisms, but parallel mechanisms with other degrees...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B25J9/00
CPCB25J9/0045B25J9/003
Inventor 田申崔龙王宏伟白宁张峰
Owner SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com