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Batch silicon wafer image positioning device

A technology of image positioning and silicon wafers, which is applied in transportation and packaging, electrical components, semiconductor/solid-state device manufacturing, etc., can solve problems such as low transmission efficiency, insufficient transmission power, and heavy weight, so as to improve transmission efficiency and shorten positioning time , the effect of improving positioning efficiency

Pending Publication Date: 2017-12-12
ROBOTECHN INTELLIGENT TECH CO LTD
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  • Application Information

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Problems solved by technology

[0002] With the advancement of science and technology, automation technology is more and more applied to all walks of life. Automatic processing technology is also widely used in the process of solar cell silicon wafer processing. Specifically, solar cell silicon wafers are processed in multiple processes. In the back and forth transfer process, it is necessary to concentrate batch image positioning of the silicon wafers to be processed, so as to reduce the errors in the process of processing and improve the processing quality. During the batch transfer of silicon wafers, due to the large number and weight of silicon wafers, often occur Problems such as low efficiency and insufficient transmission power have further reduced the efficiency of silicon wafer image positioning. In view of this, it is necessary to develop a silicon wafer batch image positioning device to solve the above problems

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  • Batch silicon wafer image positioning device
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Embodiment Construction

[0033] The present invention will be further described in detail below in conjunction with the accompanying drawings, and the aforementioned and other objects, features, aspects and advantages of the present invention will become more apparent, so that those skilled in the art can implement them with reference to the description. In the drawings, the shapes and dimensions may be exaggerated for clarity, and the same reference numerals will be used throughout to designate the same or like parts. In the specification, relative terms such as "front", "rear", "upper", "lower", "top" and "bottom" and their derivatives shall be construed as referring to the Orientation shown in the figure in question. These relative terms are for convenience of description and are generally not intended to require a specific orientation. Terms referring to attachment, coupling, etc. (e.g., "connected" and "attached") refer to a fixed or attached relationship, as well as a movable or rigid attachmen...

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Abstract

The invention discloses a batch silicon wafer image positioning device which comprises an feeding station and a discharging station which are sequentially arranged on the horizontal plane along the horizontal axis X, and further comprises a transferring station between the feeding station and the discharging station, wherein conveying mechanisms are symmetrically arranged on the feeding station and the discharging station, a transferring mechanism is arranged on the transferring station, the conveying mechanism on the feeding station and the conveying mechanism on the discharging station are jointed against each other and communicated with each other, and the area in which the transferring mechanism is occupied and the area in which the two conveying mechanisms are occupied are overlapped. In the device, the silicon wafer image positioning can be completed while improving the batch silicon wafer transferring efficiency, the positioning time is greatly shortened, and the positioning efficiency is improved.

Description

technical field [0001] The invention relates to the field of non-standard automation, in particular to a batch image positioning device for silicon wafers. Background technique [0002] With the advancement of science and technology, automation technology is more and more applied to all walks of life. Automatic processing technology is also widely used in the process of solar cell silicon wafer processing. Specifically, solar cell silicon wafers are processed in multiple processes. In the back and forth transfer process, it is necessary to concentrate batch image positioning of the silicon wafers to be processed, so as to reduce the errors in the process of processing and improve the processing quality. During the batch transfer of silicon wafers, due to the large number and weight of silicon wafers, often occur Problems such as low efficiency and insufficient transmission power further reduce the efficiency of silicon wafer image positioning. In view of this, it is necessar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677H01L21/68
CPCH01L21/67781H01L21/681
Inventor 张学强戴军张建伟贾宇鹏
Owner ROBOTECHN INTELLIGENT TECH CO LTD