Method for forming patterns on polyester/silk cloth surface through magnetron sputtering technology

A magnetron sputtering, polyester technology, used in sputtering plating, textile decoration, textile and papermaking, etc., to achieve the effect of strong adhesion, uniform and tight film layer, and changing appearance characteristics
CN107558271AInactive Publication Date: 2018-01-09信成(亚洲)有限公司

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
信成(亚洲)有限公司
Publication Date
2018-01-09
Estimated Expiration
Not applicable · inactive patent
Patent Text Reader

Abstract

The invention discloses a method for forming patterns on a polyester / silk cloth surface through a magnetron sputtering technology. The method comprises: 1) respectively carrying out coating finishingand laser etching on the surface of a fabric; and 2) coating the fabric surface being subjected to coating finishing and laser etching with a metal plating layer by using magnetron sputtering. According to the present invention, by combining magnetron sputtering, coating finishing and laser etching, the problem that the pattern is formed on the metal fabric is effectively solved, the original appearance characteristics of the fabric are changed, and the formed pattern is clear and distortion-free, and has good fastness; and the process has advantages of strong practicality and high productionefficiency, and the plated film layer has advantages of uniformity, compactness, and strong adhesion.
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Description

technical field

[0001] The invention relates to the field of metal plating of textile fabrics, in particular to a method for forming patterns on polyester and silk fabrics by magnetron sputtering technology. Background technique

[0002] As metal-coated products are gradually applied to underwear, home textiles, special clothing, medical treatment, sports, military equipment and other fields, the demand for metal-coated products in domestic and foreign markets is bound to increase. At present, electroless plating technology, evaporation technology and magnetron sputtering technology can be applied to the manufacture of metal-plated fabrics, but the metal-plated fabrics produced on the basis of existing technologies cannot form decorative patterns although they have metallic luster. pattern, so that the application of the product has been greatly restricted. Contents of the invention

[0003] The technical problem to be solved by the present invention is to provide a metho...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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