Photosensitive resin composition and color filter comprising same

A technology of photosensitive resin and composition, applied in the field of photosensitive resin composition, can solve the problems of limited degree of freedom, color purity of color filter, limited brightness and contrast, and achieve improved brightness, reduced sensitivity, and excellent solvent resistance. Effect

Active Publication Date: 2018-02-02
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Efforts are being made to improve brightness and contrast through ultrafine particle size and dispersion stabilization of pigments, but the degree of freedom is limited in the selection of colorants to achieve color coordinates for display devices with high color purity
In addition, the use of colorants that have been developed, especially the pigment dispersion method of pigments, is limited for improving the color purity, brightness and contrast of color filters using it

Method used

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  • Photosensitive resin composition and color filter comprising same
  • Photosensitive resin composition and color filter comprising same
  • Photosensitive resin composition and color filter comprising same

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0199] Examples 1-4 and Comparative Examples 1-3 were produced according to the ratio shown in the following Table 1. The feeding unit of each composition is gram (g).

[0200] [Table 1]

[0201]

experiment example 1

[0202] Experimental example 1. Measurement of film reduction

[0203] The said photosensitive resin composition was spin-coated (spincoated) on glass (5cm*5cm), and it prebaked (prebake) at 110 degreeC for 70 second, and formed the film. Irradiate 30mJ / cm to the entire surface of the substrate 2 exposure. After removing the film layer at the center of the substrate, check the level difference using a surface level difference measuring device.

[0204] Thereafter, the exposed substrate was developed at 0.1 mPa for 55 seconds with a developing solution (KOH, 0.04%), and the level difference was confirmed using a surface level difference measuring device.

[0205] The height difference before and after image development was confirmed, and the degree of film reduction was calculated|required, and it shows in following Table 2.

experiment example 2

[0206] Experimental example 2. Evaluation of peeling

[0207] The said photosensitive resin composition was spin-coated (spincoated) on glass (5cm*5cm), and it prebaked (prebake) at 110 degreeC for 70 second, and formed the film. The distance between the substrate on which the film is formed and the photo-mask (photo-mask) is set to 600um, and the entire surface of the substrate is irradiated with 30mJ / cm 2 exposure. Thereafter, after developing the exposed substrate at 0.2 mPa for 300 seconds with a developing solution (KOH, 0.04%), the pattern was observed with an Olympus optical microscope to confirm the degree of pattern peeling. The degree of stripping is shown in the attached figure 1 .

[0208] [Table 2]

[0209]

[0210] As above Table 2 and attached figure 1 As shown, it can be seen that when color filters are manufactured using the photosensitive resin compositions of Examples 1 to 4 containing both the compound represented by Chemical Formula 1 and th...

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PUM

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Abstract

The present invention provides a photosensitive resin composition and a color filter including the photosensitive resin composition. The present specification relates to a photosensitive resin composition containing the compound represented by Chemical Formula 1 and the compound represented by Chemical Formula 2, and a color filter including the photosensitive resin composition.

Description

technical field [0001] This specification relates to a photosensitive resin composition and a color filter containing the photosensitive resin composition. Background technique [0002] In recent years, performances characterized by high luminance and high contrast have been required for color filters. In addition, one of the main purposes of developing display elements is to differentiate the performance of display elements and improve the yield in the manufacturing process by improving color purity. [0003] Conventionally, since the type of pigment used as the colorant of the color filter exists in the color photoresist in a particle-dispersed state, it is difficult to adjust the brightness and contrast ratio by adjusting the size and distribution of the pigment particles. In the case of pigment particles, the solubility and dispersibility are poor due to aggregation in the color filter, and the large particles formed by the aggregation cause multiple scattering of light...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/033G02B5/20
CPCG02B5/20G03F7/004G03F7/033C07D311/82C09B1/16C09B11/04G02B5/223G02F1/133514G03F7/0048G03F7/027G03F7/028G03F7/032G03F7/105
Inventor 李修莲梁承秦柳璋铉李多美朴锺镐朴相均金载骏李在容
Owner LG CHEM LTD
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