Wet stripping equipment and stripping method thereof
A wet peeling and equipment technology, applied in opto-mechanical equipment, optics, instruments, etc., can solve problems such as affecting the electrical properties of products, uneven brightness of displays, and reducing product yields, and achieve the effect of improving product yields
Inactive Publication Date: 2018-03-20
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF6 Cites 4 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0006] In the end, it will directly affect the electrical properties of the product and form mura (that is, the phenomenon of uneven brightness of the display and various traces), resulting in a decrease in product yield
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0024] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the specific embodiments set forth herein. Rather, the embodiments are provided to explain the principles of the invention and its practical application, thereby enabling others skilled in the art to understand the invention for various embodiments and with various modifications as are suited to particular intended uses. In the drawings, the shapes and dimensions of elements may be exaggerated for clarity, and the same reference numerals will be used throughout to designate the same or like elements.
[0025] This embodiment discloses a wet stripping device, which is used to wet remove the photoresist formed on the substrate during the liquid crystal panel manufacturing process.
[0026] Specific reference figure 1 , the wet stripping equipme...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention discloses wet stripping equipment used for performing wet removal on photoresist on a substrate. The wet stripping equipment comprises an inlet unit, a stripping unit, a displacement unit, a washing unit, a drying unit and an outlet unit communicated with one another in sequence, wherein the displacement unit provides a displacement liquid for washing the substrate so as to displaceand remove the residual stripping solution on the substrate after passing through the stripping unit. The invention further provides a stripping method for the wet stripping equipment. The displacement unit is arranged between the stripping unit and the washing unit, and the residual stripping solution on the substrate is removed by virtue of the displacement liquid, so that the problem that ethanol amine existing in the stripping solution generally produces alkaline substances when meeting water and further corrodes other aluminum components on the substrate can be solved when the substrate is washed. Therefore, when the wet stripping equipment and the stripping method thereof are applied to a liquid crystal panel manufacturing process, electrical properties of products can be prevented from being influenced, a bad phenomenon of mura is avoided, and the product yield is greatly improved.
Description
technical field [0001] The invention belongs to the technical field of liquid crystal panel processing, and specifically relates to a wet stripping device for removing photoresist on a substrate, and a stripping method based on the wet stripping device. Background technique [0002] In the manufacturing process of the liquid crystal panel, photoresist is generally required to form a mask for a predetermined purpose, and the photoresist mask on the substrate needs to be removed after the other components are manufactured. Wet removal is generally used, and wet removal needs to be based on wet stripping equipment. In this wet stripping equipment, the photoresist is removed during the wetting, swelling and dissolving of the stripping liquid, and then the remaining stripping liquid on the substrate surface is removed by washing with water. Remove and dry the substrate. [0003] Currently commonly used solvent-based stripping solutions include ethanolamine. When washing the subs...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42G02F1/13
CPCG02F1/1303G03F7/422
Inventor 马迪
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD