A processing device for micro-nano hole array
A processing device and micro-nano hole technology, applied in the field of material processing, can solve the problems of no complete set of etching equipment, etc., and achieve the effects of improving repeatability, environmental protection operation, and simple device structure
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[0030] The technical solutions of the present invention are further described below with reference to the accompanying drawings and through specific embodiments.
[0031] A processing device for a micro-nano hole array, comprising a support frame 1, a laser device, a vacuum reaction device, a magnetic field device and an operating table 5; the laser device is installed on the support frame 1; the vacuum reaction device includes a reaction device , adsorption mechanism, vacuum conduit 33 and vacuum pump 34;
[0032] The reaction device includes an upper cover 311, a reaction box body 312 and a chassis 313; the upper cover 311 covers the top of the reaction box body 312; the reaction box body 312 is installed directly below the laser device, and its side The wall is connected to the vacuum pump 34 through the vacuum air conduit 33; the chassis 313 is mounted on the bottom of the reaction box 312, and a number of concentric annular grooves 6 are opened on the surface thereof, and...
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Abstract
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