Unlock instant, AI-driven research and patent intelligence for your innovation.

A processing device for micro-nano hole array

A processing device and micro-nano hole technology, applied in the field of material processing, can solve the problems of no complete set of etching equipment, etc., and achieve the effects of improving repeatability, environmental protection operation, and simple device structure

Active Publication Date: 2019-02-22
GUANGDONG UNIV OF TECH +1
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in order to achieve micro-nano processing of metal particles with micro-nano composite structures wrapped in gold, silver or aluminum, there is still no complete set of etching equipment that can realize this function, so it is urgent to further improve the existing processing. Improvement and optimization of processing equipment for micro-nanohole arrays

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A processing device for micro-nano hole array
  • A processing device for micro-nano hole array
  • A processing device for micro-nano hole array

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] The technical solutions of the present invention are further described below with reference to the accompanying drawings and through specific embodiments.

[0031] A processing device for a micro-nano hole array, comprising a support frame 1, a laser device, a vacuum reaction device, a magnetic field device and an operating table 5; the laser device is installed on the support frame 1; the vacuum reaction device includes a reaction device , adsorption mechanism, vacuum conduit 33 and vacuum pump 34;

[0032] The reaction device includes an upper cover 311, a reaction box body 312 and a chassis 313; the upper cover 311 covers the top of the reaction box body 312; the reaction box body 312 is installed directly below the laser device, and its side The wall is connected to the vacuum pump 34 through the vacuum air conduit 33; the chassis 313 is mounted on the bottom of the reaction box 312, and a number of concentric annular grooves 6 are opened on the surface thereof, and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a micro-nanometer hole array machining device. The micro-nanometer hole array machining device comprises a support frame, a laser device, a vacuum reaction device, a magnetic field device and a console; the vacuum reaction device comprises a reaction device, an absorbing mechanism, a vacuum air guide pipe and a vacuum pump; the reaction device comprises an upper cover, a reaction box and a chassis; the reaction box is mounted rightly below the laser device, and the side wall thereof is connected with the vacuum pump through the vacuum air guide pipe; the chassis is mounted at the bottom of the reaction box, and is provided with an annular groove in the surface and a through hole in the bottom; the absorbing mechanism comprises an absorbing chassis and a pressure adjuster; the absorbing chassis is mounted at the bottom of the chassis, and the top thereof communicates with the through hole; and one end of the pressure adjuster is connected to the absorbing chassis, and the other end is connected with the vacuum pump. The micro-nanometer hole array machining device can realize a mode of adopting micro-nanometer composite structure metal particles for micro-nanometer machining through optimal structure design, improves the machining stability, and improves the machining quality controllability.

Description

technical field [0001] The invention relates to the technical field of material processing, in particular to a processing device of a micro-nano hole array. Background technique [0002] Micro-nanopore arrays widely exist in microfluidic chips, biochips and microelectronic devices. With the continuous improvement of micro-nano processing technology, micro-nano structures with smaller processing structure size and higher precision requirements can be realized. For example, solid-state nanopores used for DNA single-molecule analysis are one of the typical cases. Compared with biological nanopores commonly used in DNA single-molecule analysis, solid-state nanopores have obvious advantages in chemical, thermal, mechanical stability, etc. large-scale processing, and precise control of its aperture. Therefore, many research groups continue to pay attention to the processing of solid-state nanopores and study the movement of biomolecules in solid-state nanopores. [0003] The c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/382B23K26/08B23K26/12B23K26/60B23K26/70
CPCB23K26/08B23K26/1224B23K26/382B23K26/60B23K26/702
Inventor 陈云麦锡全陈新高健汪正平杨海东
Owner GUANGDONG UNIV OF TECH